| Reference Type | Journal (article/letter/editorial) |
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| Title | Take-off angle and film thickness dependences of the attenuation length of X-ray photoelectrons by a trajectory reversal method |
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| Journal | Surface and Interface Analysis |
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| Authors | Gries, W. H. | Author |
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| Werner, W. | Author |
| Year | 1990 (July) | Volume | 16 |
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| Issue | 1 |
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| Publisher | Wiley |
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| DOI | doi:10.1002/sia.740160129Search in ResearchGate |
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| Generate Citation Formats |
| Mindat Ref. ID | 6502801 | Long-form Identifier | mindat:1:5:6502801:8 |
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| GUID | 0 |
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| Full Reference | Gries, W. H., Werner, W. (1990) Take-off angle and film thickness dependences of the attenuation length of X-ray photoelectrons by a trajectory reversal method. Surface and Interface Analysis, 16 (1). 149-153 doi:10.1002/sia.740160129 |
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| Plain Text | Gries, W. H., Werner, W. (1990) Take-off angle and film thickness dependences of the attenuation length of X-ray photoelectrons by a trajectory reversal method. Surface and Interface Analysis, 16 (1). 149-153 doi:10.1002/sia.740160129 |
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| In | (1990, July) Surface and Interface Analysis Vol. 16 (1) Wiley |
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