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Pecora, A., Maiolo, L., Fortunato, G., Caligiore, C. (2006) A comparative analysis of silicon dioxide films deposited by ECR-PECVD, TEOS-PECVD and Vapox-APCVD. Journal of Non-Crystalline Solids, 352 (9) 1430-1433 doi:10.1016/j.jnoncrysol.2005.10.030

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Reference TypeJournal (article/letter/editorial)
TitleA comparative analysis of silicon dioxide films deposited by ECR-PECVD, TEOS-PECVD and Vapox-APCVD
JournalJournal of Non-Crystalline Solids
AuthorsPecora, A.Author
Maiolo, L.Author
Fortunato, G.Author
Caligiore, C.Author
Year2006 (June)Volume352
Issue9
PublisherElsevier BV
DOIdoi:10.1016/j.jnoncrysol.2005.10.030Search in ResearchGate
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Mindat Ref. ID644270Long-form Identifiermindat:1:5:644270:9
GUID0
Full ReferencePecora, A., Maiolo, L., Fortunato, G., Caligiore, C. (2006) A comparative analysis of silicon dioxide films deposited by ECR-PECVD, TEOS-PECVD and Vapox-APCVD. Journal of Non-Crystalline Solids, 352 (9) 1430-1433 doi:10.1016/j.jnoncrysol.2005.10.030
Plain TextPecora, A., Maiolo, L., Fortunato, G., Caligiore, C. (2006) A comparative analysis of silicon dioxide films deposited by ECR-PECVD, TEOS-PECVD and Vapox-APCVD. Journal of Non-Crystalline Solids, 352 (9) 1430-1433 doi:10.1016/j.jnoncrysol.2005.10.030
In(2006, June) Journal of Non-Crystalline Solids Vol. 352 (9) Elsevier BV

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