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Gupta, Namita Dutta, Longeaud, C., Chaudhuri, P., Bhaduri, A., Vignoli, S. (2006) Some properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar–CH4 mixtures. Journal of Non-Crystalline Solids, 352 (9) 1307-1309 doi:10.1016/j.jnoncrysol.2005.10.042

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Reference TypeJournal (article/letter/editorial)
TitleSome properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar–CH4 mixtures
JournalJournal of Non-Crystalline Solids
AuthorsGupta, Namita DuttaAuthor
Longeaud, C.Author
Chaudhuri, P.Author
Bhaduri, A.Author
Vignoli, S.Author
Year2006 (June)Volume352
Issue9
PublisherElsevier BV
DOIdoi:10.1016/j.jnoncrysol.2005.10.042Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID644283Long-form Identifiermindat:1:5:644283:9
GUID0
Full ReferenceGupta, Namita Dutta, Longeaud, C., Chaudhuri, P., Bhaduri, A., Vignoli, S. (2006) Some properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar–CH4 mixtures. Journal of Non-Crystalline Solids, 352 (9) 1307-1309 doi:10.1016/j.jnoncrysol.2005.10.042
Plain TextGupta, Namita Dutta, Longeaud, C., Chaudhuri, P., Bhaduri, A., Vignoli, S. (2006) Some properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar–CH4 mixtures. Journal of Non-Crystalline Solids, 352 (9) 1307-1309 doi:10.1016/j.jnoncrysol.2005.10.042
In(2006, June) Journal of Non-Crystalline Solids Vol. 352 (9) Elsevier BV

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Vignoli, S., Chaudhuri, P., Bhaduri, A., Gupta, N. Dutta, Longeaud, C. (2006) Hydrogenated amorphous silicon–carbon alloys obtained from Ar–SiH4–CH4 gas mixtures: Structural and transport properties. Journal of Non-Crystalline Solids, 352 (9) 1384-1387 doi:10.1016/j.jnoncrysol.2005.11.103
Ray, Partha Pratim, Dutta Gupta, Namita, Chaudhuri, Partha, Williamson, D.L, Vignoli, S, Longeaud, C (2002) Properties of Si:H thin films deposited by rf-PECVD of silane–argon mixtures with variation of the plasma condition. Journal of Non-Crystalline Solids, 299. 123-127 doi:10.1016/s0022-3093(01)00947-4
Chaudhuri, Partha, Bhaduri, Ayana, Bandyopadhyay, Atul, Vignoli, Stephane, Ray, Partha Pratim, Longeaud, Christophe (2008) High diffusion length silicon germanium alloy thin films deposited by pulsed rf PECVD method. Journal of Non-Crystalline Solids, 354 (19) 2105-2108 doi:10.1016/j.jnoncrysol.2007.09.077
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Chaudhuri, Partha, Das, Debajyoti, Pratim Ray, Partha, Dutta Gupta, Namita, Roy, Dhananjoy, Longeaud, Christophe (2004) Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared with hydrogen dilution. Journal of Non-Crystalline Solids, 338. 236-239 doi:10.1016/j.jnoncrysol.2004.02.061
Chaudhuri, P., Gupta, N. Dutta, Bhaduri, A., Longeaud, C., Vignoli, S., Marty, O. (2005) Powder evolution at low powers in silane-argon discharge. Journal of Applied Physics, 98 (4). 44913pp. doi:10.1063/1.2011778
Pecora, A., Maiolo, L., Fortunato, G., Caligiore, C. (2006) A comparative analysis of silicon dioxide films deposited by ECR-PECVD, TEOS-PECVD and Vapox-APCVD. Journal of Non-Crystalline Solids, 352 (9) 1430-1433 doi:10.1016/j.jnoncrysol.2005.10.030
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Bhaduri, A., Chaudhuri, P., Williamson, D. L., Vignoli, S., Ray, P. P., Longeaud, C. (2008) Structural and optoelectronic properties of silicon germanium alloy thin films deposited by pulsed radio frequency plasma enhanced chemical vapor deposition. Journal of Applied Physics, 104 (6). 63709pp. doi:10.1063/1.2981190
Swain, B.P., Gundu Rao, T.K., Dusane, R.O. (2006) Time resolved photoluminescence of hydrogenated amorphous silicon carbon thin films deposited by HWCVD. Journal of Non-Crystalline Solids, 352 (9) 1416-1420 doi:10.1016/j.jnoncrysol.2006.02.020
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