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Thevenod, L., Cassé, M., Desrat, W., Mouis, M., Reimbold, G., Maude, D. K., Boulanger, F. (2007) Magnetoresistance mobility extraction on TiN∕HfO2∕SiO2 metal-oxide-semiconductor field effect transistors. Applied Physics Letters, 90 (15). 152111pp. doi:10.1063/1.2721363

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Reference TypeJournal (article/letter/editorial)
TitleMagnetoresistance mobility extraction on TiN∕HfO2∕SiO2 metal-oxide-semiconductor field effect transistors
JournalApplied Physics Letters
AuthorsThevenod, L.Author
Cassé, M.Author
Desrat, W.Author
Mouis, M.Author
Reimbold, G.Author
Maude, D. K.Author
Boulanger, F.Author
Year2007 (April 9)Volume90
Issue15
PublisherAIP Publishing
DOIdoi:10.1063/1.2721363Search in ResearchGate
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Mindat Ref. ID8553366Long-form Identifiermindat:1:5:8553366:0
GUID0
Full ReferenceThevenod, L., Cassé, M., Desrat, W., Mouis, M., Reimbold, G., Maude, D. K., Boulanger, F. (2007) Magnetoresistance mobility extraction on TiN∕HfO2∕SiO2 metal-oxide-semiconductor field effect transistors. Applied Physics Letters, 90 (15). 152111pp. doi:10.1063/1.2721363
Plain TextThevenod, L., Cassé, M., Desrat, W., Mouis, M., Reimbold, G., Maude, D. K., Boulanger, F. (2007) Magnetoresistance mobility extraction on TiN∕HfO2∕SiO2 metal-oxide-semiconductor field effect transistors. Applied Physics Letters, 90 (15). 152111pp. doi:10.1063/1.2721363
In(2007, April) Applied Physics Letters Vol. 90 (15) AIP Publishing

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