Lerman, Gilad M., Israel, Abraham, Lewis, Aaron (2006) Applying solid immersion near-field optics to Raman analysis of strained silicon thin films. Applied Physics Letters, 89 (22). 223122pp. doi:10.1063/1.2398888

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Reference Type	Journal (article/letter/editorial)
Title	Applying solid immersion near-field optics to Raman analysis of strained silicon thin films
Journal	Applied Physics Letters
Authors	Lerman, Gilad M.		Author
	Israel, Abraham		Author
	Lewis, Aaron		Author
Year	2006 (November 27)	Volume	89
Issue	22
Publisher	AIP Publishing
DOI	doi:10.1063/1.2398888Search in ResearchGate
	Generate Citation Formats
Mindat Ref. ID	8551073	Long-form Identifier	mindat:1:5:8551073:9
GUID	0
Full Reference	Lerman, Gilad M., Israel, Abraham, Lewis, Aaron (2006) Applying solid immersion near-field optics to Raman analysis of strained silicon thin films. Applied Physics Letters, 89 (22). 223122pp. doi:10.1063/1.2398888
Plain Text	Lerman, Gilad M., Israel, Abraham, Lewis, Aaron (2006) Applying solid immersion near-field optics to Raman analysis of strained silicon thin films. Applied Physics Letters, 89 (22). 223122pp. doi:10.1063/1.2398888
In	(2006, November) Applied Physics Letters Vol. 89 (22) AIP Publishing

	*Ghislain, L. P., Elings, V. B. (1998) Near-field scanning solid immersion microscope. Applied Physics Letters, 72 (22). 2779-2781 doi:10.1063/1.121457*
	*Israel, Abraham, Lewis, Aaron (2005) Optical control of light in a waveguide by high-Q cavity modulation. Applied Physics Letters, 86 (13). 131101pp. doi:10.1063/1.1853510*
	Black, D. R., Woicik, J. C., Erdtmann, M., Langdo, T. A. (2006) Imaging defects in strained-silicon thin films by glancing-incidence x-ray topography. Applied Physics Letters, 88 (22). 224102pp. doi:10.1063/1.2209411
	Yoshikawa, M., Murakami, M., Ishida, H. (2008) Highly sensitive detection of near-field Raman scattered light from strained Si∕SiGe heterostructures by scanning near-field optical Raman microscope using ultraviolet resonant Raman scattering. Applied Physics Letters, 92 (9). 91903pp. doi:10.1063/1.2870201
	Wang, Lin, Pitter, Mark C., Somekh, Michael G. (2010) Wide-field high-resolution solid immersion fluorescence microscopy applying an aplanatic solid immersion lens. Applied Optics, 49. 6160pp. doi:10.1364/ao.49.006160
	Kim, Jeehwan, Xie, Ya-Hong (2006) Fabrication of dislocation-free tensile strained Si thin films using controllably oxidized porous Si substrates. Applied Physics Letters, 89 (15). 152117pp. doi:10.1063/1.2360930
	Lau, H. W., Tan, O. K. (2006) Influence of oxidizing ambient to tetraethylorthosilicate thin films containing solid-state reaction silicon nanocrystals. Applied Physics Letters, 88 (10). 103101pp. doi:10.1063/1.2182071
	*Winter, G., Barnes, W. L. (2006) Emission of light through thin silver films via near-field coupling to surface plasmon polaritons. Applied Physics Letters, 88 (5). 51109pp. doi:10.1063/1.2170426*
	*Paesler, Michael A., Moyer, Patrick J., Lewis, Aaron (1997) Near‐Field Optics: Theory, Instrumentation, and Applications. Physics Today, 50. 67 doi:10.1063/1.882005*
	Zhang, Zhen, Yoon, Juil, Suo, Zhigang (2006) Method to analyze dislocation injection from sharp features in strained silicon structures. Applied Physics Letters, 89 (26). 261912pp. doi:10.1063/1.2424665
	*Aharoni, Abraham, Gover, Abraham, Jassby, Kenneth M. (1985) Near-field analysis of the knife-edge technique. Applied Optics, 24. 3018pp. doi:10.1364/ao.24.003018*

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Lerman, Gilad M., Israel, Abraham, Lewis, Aaron (2006) Applying solid immersion near-field optics to Raman analysis of strained silicon thin films. Applied Physics Letters, 89 (22). 223122pp. doi:10.1063/1.2398888

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