| Reference Type | Journal (article/letter/editorial) |
|---|
| Title | On the crystalline structure, stoichiometry and band gap of InN thin films |
|---|
| Journal | Applied Physics Letters |
|---|
| Authors | Yu, K. M. | Author |
|---|
| Liliental-Weber, Z. | Author |
| Walukiewicz, W. | Author |
| Shan, W. | Author |
| Ager, J. W. | Author |
| Li, S. X. | Author |
| Jones, R. E. | Author |
| Haller, E. E. | Author |
| Lu, Hai | Author |
| Schaff, William J. | Author |
| Year | 2005 | Volume | 86 |
|---|
| Issue | 7 |
|---|
| Publisher | AIP Publishing |
|---|
| DOI | doi:10.1063/1.1861513Search in ResearchGate |
|---|
| Generate Citation Formats |
| Mindat Ref. ID | 8543797 | Long-form Identifier | mindat:1:5:8543797:7 |
|---|
|
| GUID | 0 |
|---|
| Full Reference | Yu, K. M., Liliental-Weber, Z., Walukiewicz, W., Shan, W., Ager, J. W., Li, S. X., Jones, R. E., Haller, E. E., Lu, Hai, Schaff, William J. (2005) On the crystalline structure, stoichiometry and band gap of InN thin films. Applied Physics Letters, 86 (7). 71910pp. doi:10.1063/1.1861513 |
|---|
| Plain Text | Yu, K. M., Liliental-Weber, Z., Walukiewicz, W., Shan, W., Ager, J. W., Li, S. X., Jones, R. E., Haller, E. E., Lu, Hai, Schaff, William J. (2005) On the crystalline structure, stoichiometry and band gap of InN thin films. Applied Physics Letters, 86 (7). 71910pp. doi:10.1063/1.1861513 |
|---|
| In | (2005) Applied Physics Letters Vol. 86 (7) AIP Publishing |
|---|
These are possibly similar items as determined by title/reference text matching only.