Itoh, Takashi, Hibino, Shun, Sahashi, Tatsuro, Kato, Yoshinori, Koiso, Sunao, Ohashi, Fumitaka, Nonomura, Shuichi (2012) InXGa1-XN films deposited by reactive RF-sputtering. Journal of Non-Crystalline Solids, 358 (17) 2362-2365 doi:10.1016/j.jnoncrysol.2012.01.023
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | InXGa1-XN films deposited by reactive RF-sputtering | ||
| Journal | Journal of Non-Crystalline Solids | ||
| Authors | Itoh, Takashi | Author | |
| Hibino, Shun | Author | ||
| Sahashi, Tatsuro | Author | ||
| Kato, Yoshinori | Author | ||
| Koiso, Sunao | Author | ||
| Ohashi, Fumitaka | Author | ||
| Nonomura, Shuichi | Author | ||
| Year | 2012 (September) | Volume | 358 |
| Issue | 17 | ||
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/j.jnoncrysol.2012.01.023Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 648784 | Long-form Identifier | mindat:1:5:648784:7 |
| GUID | 0 | ||
| Full Reference | Itoh, Takashi, Hibino, Shun, Sahashi, Tatsuro, Kato, Yoshinori, Koiso, Sunao, Ohashi, Fumitaka, Nonomura, Shuichi (2012) InXGa1-XN films deposited by reactive RF-sputtering. Journal of Non-Crystalline Solids, 358 (17) 2362-2365 doi:10.1016/j.jnoncrysol.2012.01.023 | ||
| Plain Text | Itoh, Takashi, Hibino, Shun, Sahashi, Tatsuro, Kato, Yoshinori, Koiso, Sunao, Ohashi, Fumitaka, Nonomura, Shuichi (2012) InXGa1-XN films deposited by reactive RF-sputtering. Journal of Non-Crystalline Solids, 358 (17) 2362-2365 doi:10.1016/j.jnoncrysol.2012.01.023 | ||
| In | (2012, September) Journal of Non-Crystalline Solids Vol. 358 (17) Elsevier BV | ||
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