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Johnson, E.V., Pouliquen, S., Delattre, P.A., Booth, J.P. (2012) Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring. Journal of Non-Crystalline Solids, 358 (17) 1974-1977 doi:10.1016/j.jnoncrysol.2012.01.014

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Reference TypeJournal (article/letter/editorial)
TitleHydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring
JournalJournal of Non-Crystalline Solids
AuthorsJohnson, E.V.Author
Pouliquen, S.Author
Delattre, P.A.Author
Booth, J.P.Author
Year2012 (September)Volume358
Issue17
PublisherElsevier BV
DOIdoi:10.1016/j.jnoncrysol.2012.01.014Search in ResearchGate
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Mindat Ref. ID648775Long-form Identifiermindat:1:5:648775:5
GUID0
Full ReferenceJohnson, E.V., Pouliquen, S., Delattre, P.A., Booth, J.P. (2012) Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring. Journal of Non-Crystalline Solids, 358 (17) 1974-1977 doi:10.1016/j.jnoncrysol.2012.01.014
Plain TextJohnson, E.V., Pouliquen, S., Delattre, P.A., Booth, J.P. (2012) Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring. Journal of Non-Crystalline Solids, 358 (17) 1974-1977 doi:10.1016/j.jnoncrysol.2012.01.014
In(2012, September) Journal of Non-Crystalline Solids Vol. 358 (17) Elsevier BV

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Johnson, Erik V., Pouliquen, Sylvain, Delattre, Pierre-Alexandre, Booth, Jean-Paul (2012) Tailored Voltage Waveform Deposition of Microcrystalline Silicon Thin Films from Hydrogen-Diluted Silane and Silicon Tetrafluoride: Optoelectronic Properties of Films. Japanese Journal of Applied Physics, 51. 8 doi:10.1143/jjap.51.08hf01
Johnson, Erik V., Pouliquen, Sylvain, Delattre, Pierre-Alexandre, Booth, Jean-Paul (2012) Tailored Voltage Waveform Deposition of Microcrystalline Silicon Thin Films from Hydrogen-Diluted Silane and Silicon Tetrafluoride: Optoelectronic Properties of Films. Japanese Journal of Applied Physics, 51 (8) 8 doi:10.7567/jjap.51.08hf01
Günes, Mehmet, Cansever, Hamza, Yilmaz, Gökhan, Smirnov, Vladimir, Finger, Friedhelm, Brüggemann, Rudolf (2012) Metastability effects in hydrogenated microcrystalline silicon thin films investigated by the dual beam photoconductivity method. Journal of Non-Crystalline Solids, 358 (17) 2074-2077 doi:10.1016/j.jnoncrysol.2012.01.063
Zhang, Yiying, Du, Piyi, Zhang, Ran, Han, Gaorong, Weng, Wenjian (2008) Structure and properties of hydrogenated amorphous silicon carbide thin films deposited by PECVD. Journal of Non-Crystalline Solids, 354 (12) 1435-1439 doi:10.1016/j.jnoncrysol.2006.11.047
Van Aken, Bas B., Löffler, Jochen, Heijna, Maurits C.R., Soppe, Wim J. (2012) Inline deposited thin-film silicon solar cells on imprinted foil using linear PECVD sources. Journal of Non-Crystalline Solids, 358 (17) 2268-2271 doi:10.1016/j.jnoncrysol.2011.12.054
Santana, G., Fandiño, J., Ortiz, A., Alonso, J.C. (2005) Low temperature–low hydrogen content silicon nitrides thin films deposited by PECVD using dichlorosilane and ammonia mixtures. Journal of Non-Crystalline Solids, 351 (10) 922-928 doi:10.1016/j.jnoncrysol.2005.02.007
Lambertz, A., Finger, F., Holländer, B., Rath, J.K., Schropp, R.E.I. (2012) Boron-doped hydrogenated microcrystalline silicon oxide (μc-SiOx:H) for application in thin-film silicon solar cells. Journal of Non-Crystalline Solids, 358 (17) 1962-1965 doi:10.1016/j.jnoncrysol.2011.12.047
Li, Wei, Xia, Donglin, Wang, Huifang, Zhao, Xiujian (2010) Hydrogenated nanocrystalline silicon thin film prepared by RF-PECVD at high pressure. Journal of Non-Crystalline Solids, 356 (44) 2552-2556 doi:10.1016/j.jnoncrysol.2010.07.064
Ali, Atif Mossad, Kobayashi, Hikaru (2014) Hydrogen effect on nanostructural features of nanocrystalline silicon thin films deposited at 200°C by PECVD. Journal of Non-Crystalline Solids, 385. 17-23 doi:10.1016/j.jnoncrysol.2013.10.019
Saito, Kimihiko, Kondo, Michio (2012) Determination factor of <110> direction growth in microcrystalline silicon thin film deposition. Journal of Non-Crystalline Solids, 358 (17) 1983-1986 doi:10.1016/j.jnoncrysol.2012.01.035
Johnson, E. V., Delattre, P. A., Booth, J. P. (2012) Microcrystalline silicon solar cells deposited using a plasma process excited by tailored voltage waveforms. Applied Physics Letters, 100 (13). 133504pp. doi:10.1063/1.3699222
 
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