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Smit, C, Hamers, E.A.G, Korevaar, B.A, van Swaaij, R.A.C.M.M, van de Sanden, M.C.M (2002) Fast deposition of microcrystalline silicon with an expanding thermal plasma. Journal of Non-Crystalline Solids, 299. 98-102 doi:10.1016/s0022-3093(01)01184-x

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Reference TypeJournal (article/letter/editorial)
TitleFast deposition of microcrystalline silicon with an expanding thermal plasma
JournalJournal of Non-Crystalline Solids
AuthorsSmit, CAuthor
Hamers, E.A.GAuthor
Korevaar, B.AAuthor
van Swaaij, R.A.C.M.MAuthor
van de Sanden, M.C.MAuthor
Year2002 (April)Volume299
PublisherElsevier BV
DOIdoi:10.1016/s0022-3093(01)01184-xSearch in ResearchGate
Generate Citation Formats
Mindat Ref. ID640356Long-form Identifiermindat:1:5:640356:4
GUID0
Full ReferenceSmit, C, Hamers, E.A.G, Korevaar, B.A, van Swaaij, R.A.C.M.M, van de Sanden, M.C.M (2002) Fast deposition of microcrystalline silicon with an expanding thermal plasma. Journal of Non-Crystalline Solids, 299. 98-102 doi:10.1016/s0022-3093(01)01184-x
Plain TextSmit, C, Hamers, E.A.G, Korevaar, B.A, van Swaaij, R.A.C.M.M, van de Sanden, M.C.M (2002) Fast deposition of microcrystalline silicon with an expanding thermal plasma. Journal of Non-Crystalline Solids, 299. 98-102 doi:10.1016/s0022-3093(01)01184-x
In(2002) Journal of Non-Crystalline Solids Vol. 299. Elsevier BV

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van Swaaij, R.A.C.M.M., Jiménez Zambrano, R., Smit, C., van de Sanden, M.C.M. (2006) New insights in microcrystalline silicon deposition with expanding thermal plasma chemical vapor deposition. Journal of Non-Crystalline Solids, 352 (9) 933-936 doi:10.1016/j.jnoncrysol.2005.11.109
Brinza, M, Adriaenssens, G.J, Iakoubovskii, K, Stesmans, A, Kessels, W.M.M, Smets, A.H.M, van de Sanden, M.C.M (2002) Time-of-flight photocurrents in expanding-thermal-plasma-deposited a-Si:H. Journal of Non-Crystalline Solids, 299. 420-424 doi:10.1016/s0022-3093(01)01178-4
Smit, C., Swaaij, R. A. C. M. M. van, Hamers, E. A. G., Sanden, M. C. M. van de (2004) The role of the silyl radical in plasma deposition of microcrystalline silicon. Journal of Applied Physics, 96 (8). 4076-4083 doi:10.1063/1.1790577
Kessels, W.M.M., Houston, I.J., Nadir, K., van de Sanden, M.C.M. (2006) High-rate deposition of nanocrystalline silicon using the expanding thermal plasma technique. Journal of Non-Crystalline Solids, 352 (9) 915-918 doi:10.1016/j.jnoncrysol.2006.01.044
Smets, A.H.M., van Helden, J.H., van de Sanden, M.C.M. (2002) Bulk and surface defects in a-Si:H films studied by means of the cavity ring down absorption technique. Journal of Non-Crystalline Solids, 299. 610-614 doi:10.1016/s0022-3093(01)01026-2
Bronneberg, A.C., de Sanden, M.C.M. van, Creatore, M. (2012) Remote plasma deposition of microcrystalline silicon thin-films: Film structure and the role of atomic hydrogen. Journal of Non-Crystalline Solids, 358 (2) 379-386 doi:10.1016/j.jnoncrysol.2011.10.005
Korevaar, B.A, Adriaenssens, G.J, Smets, A.H.M, Kessels, W.M.M, Song, H.-Z, van de Sanden, M.C.M, Schram, D.C (2000) High hole drift mobility in a-Si:H deposited at high growth rates for solar cell application. Journal of Non-Crystalline Solids, 266. 380-384 doi:10.1016/s0022-3093(99)00735-8
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Hamers, E.A.G, van Sark, W.G.J.H.M, Bezemer, J, Meiling, H, van der Weg, W.F (1998) Structural properties of a-Si:H related to ion energy distributions in VHF silane deposition plasmas. Journal of Non-Crystalline Solids, 226 (3) 205-216 doi:10.1016/s0022-3093(98)00453-0
Nickel, N.H, Rakel, M (2002) Metastable defect kinetics in microcrystalline silicon. Journal of Non-Crystalline Solids, 299. 502-506 doi:10.1016/s0022-3093(01)00960-7
Das, Ujjwal K., Morrison, Scott, Madan, Arun (2002) Deposition of microcrystalline silicon solar cells via the pulsed PECVD technique. Journal of Non-Crystalline Solids, 299. 79-82 doi:10.1016/s0022-3093(01)00945-0
 
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