Bolkhovityanov, Yu. B., Gutakovskii, A. K., Mashanov, V. I., Pchelyakov, O. P., Revenko, M. A., Sokolov, L. V. (2002) Plastic relaxation of solid GeSi solutions grown by molecular-beam epitaxy on the low temperature Si(100) buffer layer. Journal of Applied Physics, 91 (7). 4710-4714 doi:10.1063/1.1456959
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Plastic relaxation of solid GeSi solutions grown by molecular-beam epitaxy on the low temperature Si(100) buffer layer | ||
| Journal | Journal of Applied Physics | ||
| Authors | Bolkhovityanov, Yu. B. | Author | |
| Gutakovskii, A. K. | Author | ||
| Mashanov, V. I. | Author | ||
| Pchelyakov, O. P. | Author | ||
| Revenko, M. A. | Author | ||
| Sokolov, L. V. | Author | ||
| Year | 2002 (April) | Volume | 91 |
| Issue | 7 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.1456959Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5114436 | Long-form Identifier | mindat:1:5:5114436:4 |
| GUID | 0 | ||
| Full Reference | Bolkhovityanov, Yu. B., Gutakovskii, A. K., Mashanov, V. I., Pchelyakov, O. P., Revenko, M. A., Sokolov, L. V. (2002) Plastic relaxation of solid GeSi solutions grown by molecular-beam epitaxy on the low temperature Si(100) buffer layer. Journal of Applied Physics, 91 (7). 4710-4714 doi:10.1063/1.1456959 | ||
| Plain Text | Bolkhovityanov, Yu. B., Gutakovskii, A. K., Mashanov, V. I., Pchelyakov, O. P., Revenko, M. A., Sokolov, L. V. (2002) Plastic relaxation of solid GeSi solutions grown by molecular-beam epitaxy on the low temperature Si(100) buffer layer. Journal of Applied Physics, 91 (7). 4710-4714 doi:10.1063/1.1456959 | ||
| In | (2002, April) Journal of Applied Physics Vol. 91 (7) AIP Publishing | ||
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