| Reference Type | Journal (article/letter/editorial) |
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| Title | The influence of collector dopant profile on breakdown voltage and cutoff frequency of Si-based RF bipolar transistors |
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| Journal | physica status solidi (c) |
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| Authors | Schippel, Christian | Author |
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| Fu, Jun | Author |
| Schwierz, Frank | Author |
| Year | 2006 (March) | Volume | 3 |
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| Issue | 3 |
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| Publisher | Wiley |
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| DOI | doi:10.1002/pssc.200564126Search in ResearchGate |
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| Generate Citation Formats |
| Mindat Ref. ID | 5111562 | Long-form Identifier | mindat:1:5:5111562:7 |
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| GUID | 0 |
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| Full Reference | Schippel, Christian, Fu, Jun, Schwierz, Frank (2006) The influence of collector dopant profile on breakdown voltage and cutoff frequency of Si-based RF bipolar transistors. physica status solidi (c), 3 (3). 494-498 doi:10.1002/pssc.200564126 |
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| Plain Text | Schippel, Christian, Fu, Jun, Schwierz, Frank (2006) The influence of collector dopant profile on breakdown voltage and cutoff frequency of Si-based RF bipolar transistors. physica status solidi (c), 3 (3). 494-498 doi:10.1002/pssc.200564126 |
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| In | (2006, March) physica status solidi (c) Vol. 3 (3) Wiley |
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