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Schamm, S., Bonafos, C., Coffin, H., Cherkashin, N., Carrada, M., Ben Assayag, G., Claverie, A., Tencé, M., Colliex, C. (2008) Imaging Si nanoparticles embedded in SiO2 layers by (S)TEM-EELS. Ultramicroscopy, 108 (4). 346-357 doi:10.1016/j.ultramic.2007.05.008

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Reference TypeJournal (article/letter/editorial)
TitleImaging Si nanoparticles embedded in SiO2 layers by (S)TEM-EELS
JournalUltramicroscopy
AuthorsSchamm, S.Author
Bonafos, C.Author
Coffin, H.Author
Cherkashin, N.Author
Carrada, M.Author
Ben Assayag, G.Author
Claverie, A.Author
Tencé, M.Author
Colliex, C.Author
Year2008 (March)Volume108
Issue4
PublisherElsevier BV
DOIdoi:10.1016/j.ultramic.2007.05.008Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID4904625Long-form Identifiermindat:1:5:4904625:4
GUID0
Full ReferenceSchamm, S., Bonafos, C., Coffin, H., Cherkashin, N., Carrada, M., Ben Assayag, G., Claverie, A., Tencé, M., Colliex, C. (2008) Imaging Si nanoparticles embedded in SiO2 layers by (S)TEM-EELS. Ultramicroscopy, 108 (4). 346-357 doi:10.1016/j.ultramic.2007.05.008
Plain TextSchamm, S., Bonafos, C., Coffin, H., Cherkashin, N., Carrada, M., Ben Assayag, G., Claverie, A., Tencé, M., Colliex, C. (2008) Imaging Si nanoparticles embedded in SiO2 layers by (S)TEM-EELS. Ultramicroscopy, 108 (4). 346-357 doi:10.1016/j.ultramic.2007.05.008
In(2008, March) Ultramicroscopy Vol. 108 (4) Elsevier BV

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