Narushima, Takayuki, Kato, Michihisa, Murase, Shin, Ouchi, Chiaki, Iguchi, Yasutaka (2002) Oxidation of Silicon and Silicon Carbide in Ozone-Containing Atmospheres at 973 K. Journal of the American Ceramic Society, 85 (8). 2049-2055 doi:10.1111/j.1151-2916.2002.tb00402.x
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Oxidation of Silicon and Silicon Carbide in Ozone-Containing Atmospheres at 973 K | ||
| Journal | Journal of the American Ceramic Society | ||
| Authors | Narushima, Takayuki | Author | |
| Kato, Michihisa | Author | ||
| Murase, Shin | Author | ||
| Ouchi, Chiaki | Author | ||
| Iguchi, Yasutaka | Author | ||
| Year | 2002 (August) | Volume | 85 |
| Issue | 8 | ||
| Publisher | Wiley | ||
| DOI | doi:10.1111/j.1151-2916.2002.tb00402.xSearch in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 4096524 | Long-form Identifier | mindat:1:5:4096524:8 |
| GUID | 0 | ||
| Full Reference | Narushima, Takayuki, Kato, Michihisa, Murase, Shin, Ouchi, Chiaki, Iguchi, Yasutaka (2002) Oxidation of Silicon and Silicon Carbide in Ozone-Containing Atmospheres at 973 K. Journal of the American Ceramic Society, 85 (8). 2049-2055 doi:10.1111/j.1151-2916.2002.tb00402.x | ||
| Plain Text | Narushima, Takayuki, Kato, Michihisa, Murase, Shin, Ouchi, Chiaki, Iguchi, Yasutaka (2002) Oxidation of Silicon and Silicon Carbide in Ozone-Containing Atmospheres at 973 K. Journal of the American Ceramic Society, 85 (8). 2049-2055 doi:10.1111/j.1151-2916.2002.tb00402.x | ||
| In | (2002, August) Journal of the American Ceramic Society Vol. 85 (8) Wiley | ||
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