Narushima, Takayuki, Goto, Takashi, Yokoyama, Yoshio, Iguchi, Yasutaka, Hirai, Toshio (1993) High-Temperature Active Oxidation of Chemically Vapor-Deposited Silicon Carbide in COCO2 Atmosphere. Journal of the American Ceramic Society, 76 (10). 2521-2524 doi:10.1111/j.1151-2916.1993.tb03975.x
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | High-Temperature Active Oxidation of Chemically Vapor-Deposited Silicon Carbide in COCO2 Atmosphere | ||
| Journal | Journal of the American Ceramic Society | ||
| Authors | Narushima, Takayuki | Author | |
| Goto, Takashi | Author | ||
| Yokoyama, Yoshio | Author | ||
| Iguchi, Yasutaka | Author | ||
| Hirai, Toshio | Author | ||
| Year | 1993 (October) | Volume | 76 |
| Issue | 10 | ||
| Publisher | Wiley | ||
| DOI | doi:10.1111/j.1151-2916.1993.tb03975.xSearch in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 4090973 | Long-form Identifier | mindat:1:5:4090973:8 |
| GUID | 0 | ||
| Full Reference | Narushima, Takayuki, Goto, Takashi, Yokoyama, Yoshio, Iguchi, Yasutaka, Hirai, Toshio (1993) High-Temperature Active Oxidation of Chemically Vapor-Deposited Silicon Carbide in COCO2 Atmosphere. Journal of the American Ceramic Society, 76 (10). 2521-2524 doi:10.1111/j.1151-2916.1993.tb03975.x | ||
| Plain Text | Narushima, Takayuki, Goto, Takashi, Yokoyama, Yoshio, Iguchi, Yasutaka, Hirai, Toshio (1993) High-Temperature Active Oxidation of Chemically Vapor-Deposited Silicon Carbide in COCO2 Atmosphere. Journal of the American Ceramic Society, 76 (10). 2521-2524 doi:10.1111/j.1151-2916.1993.tb03975.x | ||
| In | (1993, October) Journal of the American Ceramic Society Vol. 76 (10) Wiley | ||
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