| Reference Type | Journal (article/letter/editorial) |
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| Title | ChemInform Abstract: CONTROL OF PALLADIUM ADHERENCE TO SILICON DIOXIDE FOR PHOTOLITHOGRAPHIC ETCHING |
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| Journal | Chemischer Informationsdienst |
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| Authors | SHIVARAMAN, M. S. | Author |
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| SVENSSON, C. M. | Author |
| Year | 1976 (December 14) | Volume | 7 |
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| Issue | 50 |
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| Publisher | Wiley |
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| DOI | doi:10.1002/chin.197650008Search in ResearchGate |
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| Generate Citation Formats |
| Mindat Ref. ID | 14745704 | Long-form Identifier | mindat:1:5:14745704:4 |
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| GUID | 0 |
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| Full Reference | SHIVARAMAN, M. S., SVENSSON, C. M. (1976) ChemInform Abstract: CONTROL OF PALLADIUM ADHERENCE TO SILICON DIOXIDE FOR PHOTOLITHOGRAPHIC ETCHING. Chemischer Informationsdienst, 7 (50) doi:10.1002/chin.197650008 |
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| Plain Text | SHIVARAMAN, M. S., SVENSSON, C. M. (1976) ChemInform Abstract: CONTROL OF PALLADIUM ADHERENCE TO SILICON DIOXIDE FOR PHOTOLITHOGRAPHIC ETCHING. Chemischer Informationsdienst, 7 (50) doi:10.1002/chin.197650008 |
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| In | (1976, December) Chemischer Informationsdienst Vol. 7 (50) Wiley |
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