Shivaraman, M. S. (1976) Control of Palladium Adherence to Silicon Dioxide for Photolithographic Etching. Journal of the Electrochemical Society, 123. 1258pp. doi:10.1149/1.2133052
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Control of Palladium Adherence to Silicon Dioxide for Photolithographic Etching | ||
| Journal | Journal of the Electrochemical Society | ||
| Authors | Shivaraman, M. S. | Author | |
| Year | 1976 | Volume | 123 |
| Publisher | The Electrochemical Society | ||
| DOI | doi:10.1149/1.2133052Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 12041985 | Long-form Identifier | mindat:1:5:12041985:4 |
| GUID | 0 | ||
| Full Reference | Shivaraman, M. S. (1976) Control of Palladium Adherence to Silicon Dioxide for Photolithographic Etching. Journal of the Electrochemical Society, 123. 1258pp. doi:10.1149/1.2133052 | ||
| Plain Text | Shivaraman, M. S. (1976) Control of Palladium Adherence to Silicon Dioxide for Photolithographic Etching. Journal of the Electrochemical Society, 123. 1258pp. doi:10.1149/1.2133052 | ||
| In | (n.d.) Journal of the Electrochemical Society Vol. 123. The Electrochemical Society | ||
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