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Wahl, G., Schmaderer, F. (1989) Chemical vapour deposition of superconductors. Journal of Materials Science, 24. 1141-1158 doi:10.1007/bf02397041

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Reference TypeJournal (article/letter/editorial)
TitleChemical vapour deposition of superconductors
JournalJournal of Materials Science
AuthorsWahl, G.Author
Schmaderer, F.Author
Year1989 (April)Volume24
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/bf02397041Search in ResearchGate
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Mindat Ref. ID9989396Long-form Identifiermindat:1:5:9989396:7
GUID0
Full ReferenceWahl, G., Schmaderer, F. (1989) Chemical vapour deposition of superconductors. Journal of Materials Science, 24. 1141-1158 doi:10.1007/bf02397041
Plain TextWahl, G., Schmaderer, F. (1989) Chemical vapour deposition of superconductors. Journal of Materials Science, 24. 1141-1158 doi:10.1007/bf02397041
In(n.d.) Journal of Materials Science Vol. 24. Springer Science and Business Media LLC

See Also

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Schmaderer, F., Huber, R., Oetzmann, H., Wahl, G. (1990) High-Tc YBa2Cu3O7-δ prepared by chemical vapour deposition. Applied Surface Science, 46. 53-60 doi:10.1016/0169-4332(90)90119-k
SCHMADERER, F., HUBER, R., OETZMANN, H., WAHL, G. (1991) HIGH-TC-SUPERCONDUCTORS PREPARED BY CVD. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991264
FITZER, E., OETZMANN, H., SCHMADERER, F., WAHL, G. (1991) THE Ba-PROBLEM IN CVD-YBa2 Cu3 O7-[MATH] HTC SUPERCONDUCTORS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991286
Itatani, K., Kubozono, T., Howell, F. S., Kishioka, A., Kinoshita, M. (1995) Some properties of mullite powders prepared by chemical vapour deposition. Journal of Materials Science, 30. 1158-1165 doi:10.1007/bf00356114
Itoh, Hideaki, Hattori, Kenji, Naka, Shigeharu (1989) Rotary powder bed chemical vapour deposition of titanium nitride on spherical iron powder. Journal of Materials Science, 24. 3643-3646 doi:10.1007/bf02385751
Sibieude, F., Benezech, G. (1989) X-ray diffraction study of vapour deposition of molybdenum silicides on molybdenum. Journal of Materials Science Letters, 8 (11) 1323-1325 doi:10.1007/bf00721508
Chen, Lidong, Goto, Takashi, Hirai, Toshio (1989) Preparation of silicon carbide powders by chemical vapour deposition of the SiH4-CH4-H2 system. Journal of Materials Science, 24. 3824-3830 doi:10.1007/bf01168942
Colombier, C., Lux, B. (1989) Formation of mixed TiC/Al2O3 layers and ?a- and ?-Al2O3 on cemented carbides by chemical vapour deposition. Journal of Materials Science, 24. 462-470 doi:10.1007/bf01107428
Fuflyigin, V. N., Kaul, A. R., Pozigun, S. A., Klippe, L., Wahl, G. (1995) Orientation of the BSCCO films prepared by low-pressure single-aerosol source metallorganic chemical vapour deposition. Journal of Materials Science, 30. 4431-4434 doi:10.1007/bf00361528
Takahashi, Yasutaka, Kanamori, Masaaki, Hashimoto, Hiroyuki, Moritani, Yoshimitsu, Masuda, Yoshihiro (1989) Preparation of VO2 films by organometallic chemical vapour deposition and dip-coating. Journal of Materials Science, 24. 192-198 doi:10.1007/bf00660953
Sibieude, F., Benezech, G. (1988) Chemical vapour deposition of silicon carbide: An X-ray diffraction study. Journal of Materials Science, 23. 1632-1636 doi:10.1007/bf01115701
 
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