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Colombier, C., Lux, B. (1989) Formation of mixed TiC/Al2O3 layers and ?a- and ?-Al2O3 on cemented carbides by chemical vapour deposition. Journal of Materials Science, 24. 462-470 doi:10.1007/bf01107428

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Reference TypeJournal (article/letter/editorial)
TitleFormation of mixed TiC/Al2O3 layers and ?a- and ?-Al2O3 on cemented carbides by chemical vapour deposition
JournalJournal of Materials Science
AuthorsColombier, C.Author
Lux, B.Author
Year1989 (February)Volume24
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/bf01107428Search in ResearchGate
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Mindat Ref. ID9989299Long-form Identifiermindat:1:5:9989299:5
GUID0
Full ReferenceColombier, C., Lux, B. (1989) Formation of mixed TiC/Al2O3 layers and ?a- and ?-Al2O3 on cemented carbides by chemical vapour deposition. Journal of Materials Science, 24. 462-470 doi:10.1007/bf01107428
Plain TextColombier, C., Lux, B. (1989) Formation of mixed TiC/Al2O3 layers and ?a- and ?-Al2O3 on cemented carbides by chemical vapour deposition. Journal of Materials Science, 24. 462-470 doi:10.1007/bf01107428
In(n.d.) Journal of Materials Science Vol. 24. Springer Science and Business Media LLC

See Also

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Laugier, M. T. (1986) Adhesion of TiC and TiN coatings prepared by chemical vapour deposition on WC-Co-based cemented carbides. Journal of Materials Science, 21. 2269-2272 doi:10.1007/bf01114266
Kornmann, M., Schachner, H., Funk, R., Lux, B. (1975) Nucleation of alumina layers on TiC and cemented carbides by chemical vapor deposition. Journal of Crystal Growth, 28 (2). 259-262 doi:10.1016/0022-0248(75)90243-2
Yamamoto, Tsutomu, Kamachi, Kazuyoshi (1985) The Surface Residual Stress of Cemented Carbides Coated with TiC or TiN by Chemical Vapour Deposition Process and Physical Vapour Deposition Process. Journal of the Japan Institute of Metals, 49 (2). 120-124 doi:10.2320/jinstmet1952.49.2_120
Kim, N. H., Chun, J. S. (1985) A study of the tool life of TiC and TiC plus Al2O3 chemical vapour deposited tungsten carbide tools. Journal of Materials Science, 20. 1285-1290 doi:10.1007/bf01026324
Bowen, C. R., Derby, B. (1996) The formation of TiC/Al2O3 microstructures by a self-propagating high-temperature synthesis reaction. Journal of Materials Science, 31. 3791-3803 doi:10.1007/bf00352794
Bisch, C., Nadal, M., Teyssandier, F., Bancel, M., Vallon, B. (1995) Chemical vapour deposition of titanium carbide on WCCo cemented carbides. Materials Science and Engineering: A, 202. 238-248 doi:10.1016/0921-5093(95)09812-7
Matsubara, H., Sakuma, T. (1990) Diamond deposition on cemented carbide by chemical vapour deposition using a tantalum filament. Journal of Materials Science, 25. 4472-4476 doi:10.1007/bf00581110
Wang, Z., Liu, X. (2005) In-situ synthesis of Al/(TiC+α-Al2O3) and Al/(TiAl3+TiC+α-Al2O3) alloys by reactions between Al, TiO2 and C in liquid aluminum. Journal of Materials Science, 40. 1047-1050 doi:10.1007/s10853-005-6532-1
Kim, T. W., Lim, H., Zheng, Y. D., Reeder, A. A., Mccombe, B. D. (1992) Growth and characterization of Al2O3 insulator gate on p-InP and p-Si by metallorganic chemical vapour deposition at low temperatures. Journal of Materials Science, 27. 5531-5535 doi:10.1007/bf00541617
Skogsmo, J., Nordén, H. (1992) The formation of n-phase in cemented carbides during chemical vapour deposition. International Journal of Refractory Metals and Hard Materials, 11 (1). 49-61 doi:10.1016/0263-4368(92)90084-f
DANZINGER, M., HAUBNER, R., LUX, B. (1991) INFLUENCE OF ETCHING THE TiC UNDERLAYER WITH CH4/AlCl3/H2 ON THE CVD FORMATION OF KAPPA-Al2O3. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991269
 
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