Kakiuchi, Hiroaki, Ohmi, Hiromasa, Harada, Makoto, Watanabe, Heiji, Yasutake, Kiyoshi (2007) Low-temperature formation of SiO2 layers using a two-step atmospheric pressure plasma-enhanced deposition-oxidation process. Applied Physics Letters, 91 (16). 161908pp. doi:10.1063/1.2801516
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Low-temperature formation of SiO2 layers using a two-step atmospheric pressure plasma-enhanced deposition-oxidation process | ||
| Journal | Applied Physics Letters | ||
| Authors | Kakiuchi, Hiroaki | Author | |
| Ohmi, Hiromasa | Author | ||
| Harada, Makoto | Author | ||
| Watanabe, Heiji | Author | ||
| Yasutake, Kiyoshi | Author | ||
| Year | 2007 (October 15) | Volume | 91 |
| Issue | 16 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.2801516Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8556639 | Long-form Identifier | mindat:1:5:8556639:4 |
| GUID | 0 | ||
| Full Reference | Kakiuchi, Hiroaki, Ohmi, Hiromasa, Harada, Makoto, Watanabe, Heiji, Yasutake, Kiyoshi (2007) Low-temperature formation of SiO2 layers using a two-step atmospheric pressure plasma-enhanced deposition-oxidation process. Applied Physics Letters, 91 (16). 161908pp. doi:10.1063/1.2801516 | ||
| Plain Text | Kakiuchi, Hiroaki, Ohmi, Hiromasa, Harada, Makoto, Watanabe, Heiji, Yasutake, Kiyoshi (2007) Low-temperature formation of SiO2 layers using a two-step atmospheric pressure plasma-enhanced deposition-oxidation process. Applied Physics Letters, 91 (16). 161908pp. doi:10.1063/1.2801516 | ||
| In | (2007, October) Applied Physics Letters Vol. 91 (16) AIP Publishing | ||
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