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Seah, M. P., Spencer, S. J., Gilmore, I. S., Johnstone, J. E. (2000) Depth resolution in sputter depth profiling-characterization of a third batch of tantalum pentoxide on tantalum certified reference material by AES and SIMS. Surface and Interface Analysis, 29 (1). 73-81 doi:10.1002/(sici)1096-9918(200001)29:1<73::aid-sia695>3.0.co;2-3

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Reference TypeJournal (article/letter/editorial)
TitleDepth resolution in sputter depth profiling-characterization of a third batch of tantalum pentoxide on tantalum certified reference material by AES and SIMS
JournalSurface and Interface Analysis
AuthorsSeah, M. P.Author
Spencer, S. J.Author
Gilmore, I. S.Author
Johnstone, J. E.Author
Year2000 (January)Volume29
Issue1
PublisherWiley
DOIdoi:10.1002/(sici)1096-9918(200001)29:1<73::aid-sia695>3.0.co;2-3Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID6506701Long-form Identifiermindat:1:5:6506701:7
GUID0
Full ReferenceSeah, M. P., Spencer, S. J., Gilmore, I. S., Johnstone, J. E. (2000) Depth resolution in sputter depth profiling-characterization of a third batch of tantalum pentoxide on tantalum certified reference material by AES and SIMS. Surface and Interface Analysis, 29 (1). 73-81 doi:10.1002/(sici)1096-9918(200001)29:1<73::aid-sia695>3.0.co;2-3
Plain TextSeah, M. P., Spencer, S. J., Gilmore, I. S., Johnstone, J. E. (2000) Depth resolution in sputter depth profiling-characterization of a third batch of tantalum pentoxide on tantalum certified reference material by AES and SIMS. Surface and Interface Analysis, 29 (1). 73-81 doi:10.1002/(sici)1096-9918(200001)29:13.0.co;2-3
In(2000, January) Surface and Interface Analysis Vol. 29 (1) Wiley

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Hunt, C. P., Seah, M. P. (1983) Characterization of a high depth-resolution tantalum pentoxide sputter profiling reference material. Surface and Interface Analysis, 5 (5). 199-209 doi:10.1002/sia.740050506
Hofmann, Siegfried (2000) Ultimate depth resolution and profile reconstruction in sputter profiling with AES and SIMS. Surface and Interface Analysis, 30 (1). 228-236 doi:10.1002/1096-9918(200008)30:1<228::aid-sia821>3.0.co;2-e
Seah, M. P., Spencer, S. J., Cumpson, P. J., Johnstone, J. E. (2000) Sputter-induced cone and filament formation on InP and AFM tip shape determination. Surface and Interface Analysis, 29 (11). 782-790 doi:10.1002/1096-9918(200011)29:11<782::aid-sia929>3.0.co;2-1
Gilmore, I. S., Seah, M. P. (2000) Static SIMS inter-laboratory study. Surface and Interface Analysis, 29 (9). 624-637 doi:10.1002/1096-9918(200009)29:9<624::aid-sia908>3.0.co;2-f
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Ruby, C., Zhou, J. N., Du, J., Street, S. C., Barnard, J. (2000) Surface characterization of Co/CNx granular films fabricated by nanolamination. Surface and Interface Analysis, 29 (1). 38-45 doi:10.1002/(sici)1096-9918(200001)29:1<38::aid-sia691>3.0.co;2-4
Metson, J. B., Prince, K. E. (1999) SIMS depth profiling of TiOxNy films. Surface and Interface Analysis, 28 (1). 159-162 doi:10.1002/(sici)1096-9918(199908)28:1<159::aid-sia597>3.0.co;2-4
Gerenser, L. J., Grace, J. M., Apai, G., Thompson, P. M. (2000) Surface chemistry of nitrogen plasma-treated poly(ethylene-2,6-naphthalate): XPS, HREELS and static SIMS analysis. Surface and Interface Analysis, 29 (1). 12-22 doi:10.1002/(sici)1096-9918(200001)29:1<12::aid-sia687>3.0.co;2-7
Hartmann, Andreas J., Lamb, Robert N. (2000) Chemical and structural characterization of thin films using electrons and photons. Surface and Interface Analysis, 29 (1). 3-11 doi:10.1002/(sici)1096-9918(200001)29:1<3::aid-sia697>3.0.co;2-#
Carter, G. (1997) Viscoelastic Relaxation and Sputter-depth Profiling of Amorphous Materials. Surface and Interface Analysis, 25 (1). 36-40 doi:10.1002/(sici)1096-9918(199701)25:1<36::aid-sia210>3.0.co;2-i
Kim, Kyung Joong, Moon, Dae Won (1998) Ta2O5/SiO2 multilayered thin film on Si as a proposed new reference material for SIMS depth profiling. Surface and Interface Analysis, 26 (1). 9-16 doi:10.1002/(sici)1096-9918(199801)26:1<9::aid-sia341>3.0.co;2-i
 
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