| Reference Type | Journal (article/letter/editorial) |
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| Title | XPS intensity analysis for assessment of thickness and composition of thin overlayer films: Application to chemically etched GaAs(100) surfaces |
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| Journal | Surface and Interface Analysis |
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| Authors | Bernstein, R. W. | Author |
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| Grepstad, J. K. | Author |
| Year | 1989 (March) | Volume | 14 |
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| Issue | 3 |
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| Publisher | Wiley |
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| DOI | doi:10.1002/sia.740140303Search in ResearchGate |
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| Generate Citation Formats |
| Mindat Ref. ID | 6502138 | Long-form Identifier | mindat:1:5:6502138:9 |
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| GUID | 0 |
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| Full Reference | Bernstein, R. W., Grepstad, J. K. (1989) XPS intensity analysis for assessment of thickness and composition of thin overlayer films: Application to chemically etched GaAs(100) surfaces. Surface and Interface Analysis, 14 (3). 109-114 doi:10.1002/sia.740140303 |
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| Plain Text | Bernstein, R. W., Grepstad, J. K. (1989) XPS intensity analysis for assessment of thickness and composition of thin overlayer films: Application to chemically etched GaAs(100) surfaces. Surface and Interface Analysis, 14 (3). 109-114 doi:10.1002/sia.740140303 |
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| In | (1989, March) Surface and Interface Analysis Vol. 14 (3) Wiley |
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