Tollet, H., Bielen, P., Creemers, C., Van Hove, H., Neyens, A., Maex, K., De Keersmaecker, R. F. (1986) ISS-study of dopant redistribution in TiSi2 layers during silicidation by rapid thermal processing. Surface and Interface Analysis, 9 (5). 338-339 doi:10.1002/sia.740090521
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | ISS-study of dopant redistribution in TiSi2 layers during silicidation by rapid thermal processing | ||
| Journal | Surface and Interface Analysis | ||
| Authors | Tollet, H. | Author | |
| Bielen, P. | Author | ||
| Creemers, C. | Author | ||
| Van Hove, H. | Author | ||
| Neyens, A. | Author | ||
| Maex, K. | Author | ||
| De Keersmaecker, R. F. | Author | ||
| Year | 1986 (July) | Volume | 9 |
| Issue | 5 | ||
| Publisher | Wiley | ||
| DOI | doi:10.1002/sia.740090521Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 6501070 | Long-form Identifier | mindat:1:5:6501070:9 |
| GUID | 0 | ||
| Full Reference | Tollet, H., Bielen, P., Creemers, C., Van Hove, H., Neyens, A., Maex, K., De Keersmaecker, R. F. (1986) ISS-study of dopant redistribution in TiSi2 layers during silicidation by rapid thermal processing. Surface and Interface Analysis, 9 (5). 338-339 doi:10.1002/sia.740090521 | ||
| Plain Text | Tollet, H., Bielen, P., Creemers, C., Van Hove, H., Neyens, A., Maex, K., De Keersmaecker, R. F. (1986) ISS-study of dopant redistribution in TiSi2 layers during silicidation by rapid thermal processing. Surface and Interface Analysis, 9 (5). 338-339 doi:10.1002/sia.740090521 | ||
| In | (1986, July) Surface and Interface Analysis Vol. 9 (5) Wiley | ||
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