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Sameshima, T., Hasumi, M. (2012) Infrared semiconductor laser irradiation used for crystallization of silicon thin films. Journal of Non-Crystalline Solids, 358 (17) 2162-2165 doi:10.1016/j.jnoncrysol.2011.12.030

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Reference TypeJournal (article/letter/editorial)
TitleInfrared semiconductor laser irradiation used for crystallization of silicon thin films
JournalJournal of Non-Crystalline Solids
AuthorsSameshima, T.Author
Hasumi, M.Author
Year2012 (September)Volume358
Issue17
PublisherElsevier BV
DOIdoi:10.1016/j.jnoncrysol.2011.12.030Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID648701Long-form Identifiermindat:1:5:648701:4
GUID0
Full ReferenceSameshima, T., Hasumi, M. (2012) Infrared semiconductor laser irradiation used for crystallization of silicon thin films. Journal of Non-Crystalline Solids, 358 (17) 2162-2165 doi:10.1016/j.jnoncrysol.2011.12.030
Plain TextSameshima, T., Hasumi, M. (2012) Infrared semiconductor laser irradiation used for crystallization of silicon thin films. Journal of Non-Crystalline Solids, 358 (17) 2162-2165 doi:10.1016/j.jnoncrysol.2011.12.030
In(2012, September) Journal of Non-Crystalline Solids Vol. 358 (17) Elsevier BV

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