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Suzuki, Atsushi, Isomura, Masao (2012) Crystalline growth of germanium thin films on single crystal silicon substrates by solid phase crystallization. Journal of Non-Crystalline Solids, 358 (17) 2166-2170 doi:10.1016/j.jnoncrysol.2011.12.015

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Reference TypeJournal (article/letter/editorial)
TitleCrystalline growth of germanium thin films on single crystal silicon substrates by solid phase crystallization
JournalJournal of Non-Crystalline Solids
AuthorsSuzuki, AtsushiAuthor
Isomura, MasaoAuthor
Year2012 (September)Volume358
Issue17
PublisherElsevier BV
DOIdoi:10.1016/j.jnoncrysol.2011.12.015Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID648695Long-form Identifiermindat:1:5:648695:6
GUID0
Full ReferenceSuzuki, Atsushi, Isomura, Masao (2012) Crystalline growth of germanium thin films on single crystal silicon substrates by solid phase crystallization. Journal of Non-Crystalline Solids, 358 (17) 2166-2170 doi:10.1016/j.jnoncrysol.2011.12.015
Plain TextSuzuki, Atsushi, Isomura, Masao (2012) Crystalline growth of germanium thin films on single crystal silicon substrates by solid phase crystallization. Journal of Non-Crystalline Solids, 358 (17) 2166-2170 doi:10.1016/j.jnoncrysol.2011.12.015
In(2012, September) Journal of Non-Crystalline Solids Vol. 358 (17) Elsevier BV

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Kojima, Yuji, Isomura, Masao (2015) Crystalline silicon germanium films grown on crystalline silicon substrates by solid phase crystallization. Japanese Journal of Applied Physics, 54 (8) 8 doi:10.7567/jjap.54.08kb01
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Kawauchi, Hiromi, Isomura, Masao, Matsui, Takuya, Kondo, Michio (2008) Microcrystalline silicon–germanium thin films prepared by the chemical transport process using hydrogen radicals. Journal of Non-Crystalline Solids, 354 (19) 2109-2112 doi:10.1016/j.jnoncrysol.2007.09.019
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