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Ambrosio, R (2003) Silicon–germanium films prepared from SiH4 and GeF4 by low frequency plasma deposition. Journal of Non-Crystalline Solids, 329 (1) 134-139 doi:10.1016/j.jnoncrysol.2003.08.027

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Reference TypeJournal (article/letter/editorial)
TitleSilicon–germanium films prepared from SiH4 and GeF4 by low frequency plasma deposition
JournalJournal of Non-Crystalline Solids
AuthorsAmbrosio, RAuthor
Year2003 (November 1)Volume329
Issue1
PublisherElsevier BV
DOIdoi:10.1016/j.jnoncrysol.2003.08.027Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID641672Long-form Identifiermindat:1:5:641672:4
GUID0
Full ReferenceAmbrosio, R (2003) Silicon–germanium films prepared from SiH4 and GeF4 by low frequency plasma deposition. Journal of Non-Crystalline Solids, 329 (1) 134-139 doi:10.1016/j.jnoncrysol.2003.08.027
Plain TextAmbrosio, R (2003) Silicon–germanium films prepared from SiH4 and GeF4 by low frequency plasma deposition. Journal of Non-Crystalline Solids, 329 (1) 134-139 doi:10.1016/j.jnoncrysol.2003.08.027
In(2003, November) Journal of Non-Crystalline Solids Vol. 329 (1) Elsevier BV

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Zuniga, C (2003) Carbon films deposited by low frequency plasma as inter-metal dielectric. Journal of Non-Crystalline Solids, 329 (1) 174-178 doi:10.1016/j.jnoncrysol.2003.08.036
Moreno, M., Torres, A., Ambrosio, R., Rosales, P., Heredia, A., Kosarev, A., Torres, E., Zuñiga, C., Reyes-Betanzo, C., Domínguez, M. (2012) Deposition and characterization of polymorphous germanium films prepared by low frequency PECVD. Journal of Non-Crystalline Solids, 358 (17) 2099-2102 doi:10.1016/j.jnoncrysol.2012.01.061
Ambrosio, R., Torres, A., Kosarev, A., Ilinski, A., Zúñiga, C., Abramov, A.S. (2004) Low frequency plasma deposition and characterization of Si1−xGex:H,F films. Journal of Non-Crystalline Solids, 338. 91-96 doi:10.1016/j.jnoncrysol.2004.02.028
Roca i Cabarrocas, P., Cariou, R., Labrune, M. (2012) Low temperature plasma deposition of silicon thin films: From amorphous to crystalline. Journal of Non-Crystalline Solids, 358 (17) 2000-2003 doi:10.1016/j.jnoncrysol.2011.12.113
Moreno, M., Kosarev, A., Torres, A., Ambrosio, R. (2008) Comparison of three un-cooled micro-bolometers configurations based on amorphous silicon–germanium thin films deposited by plasma. Journal of Non-Crystalline Solids, 354 (19) 2598-2602 doi:10.1016/j.jnoncrysol.2007.09.116
Komura, Y., Tabata, A., Narita, T., Kondo, A., Mizutani, T. (2006) Nanocrystalline cubic silicon carbide films prepared by hot-wire chemical vapor deposition using SiH4/CH4/H2 at a low substrate temperature. Journal of Non-Crystalline Solids, 352 (9) 1367-1370 doi:10.1016/j.jnoncrysol.2005.11.102
Betancourt, I., Valenzuela, R. (2003) Low frequency magnetoimpedance for Co-based amorphous microwires. Journal of Non-Crystalline Solids, 329 (1) 155-158 doi:10.1016/j.jnoncrysol.2003.08.031
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Garcı́a, M., Ambrosio, R., Torres, A., Kosarev, A. (2004) IR bolometers based on amorphous silicon germanium alloys. Journal of Non-Crystalline Solids, 338. 744-748 doi:10.1016/j.jnoncrysol.2004.03.082
Mahtani, Pratish, Leong, Keith R., Jovet, Bastien, Yeghikyan, Davit, Kherani, Nazir P. (2012) High quality amorphous–crystalline silicon heterostructure prepared by grid-biased remote radio-frequency plasma enhanced chemical vapor deposition. Journal of Non-Crystalline Solids, 358 (23) 3396-3402 doi:10.1016/j.jnoncrysol.2012.08.015
BARANDIARAN, J (2003) Pulsed laser deposition of amorphous soft magnetic thin films for sensor applications. Journal of Non-Crystalline Solids, 329 (1) 8-12 doi:10.1016/j.jnoncrysol.2003.08.003
 
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