| Reference Type | Journal (article/letter/editorial) |
|---|
| Title | Feedback control of plasma etching reactors for improved etching uniformity |
|---|
| Journal | Chemical Engineering Science |
|---|
| Authors | Armaou, Antonios | Author |
|---|
| Baker, James | Author |
| D. Christofides, Panagiotis | Author |
| Year | 2001 (February) | Volume | 56 |
|---|
| Issue | 4 |
|---|
| Publisher | Elsevier BV |
|---|
| DOI | doi:10.1016/s0009-2509(00)00372-9Search in ResearchGate |
|---|
| Generate Citation Formats |
| Mindat Ref. ID | 6287529 | Long-form Identifier | mindat:1:5:6287529:3 |
|---|
|
| GUID | 0 |
|---|
| Full Reference | Armaou, Antonios, Baker, James, D. Christofides, Panagiotis (2001) Feedback control of plasma etching reactors for improved etching uniformity. Chemical Engineering Science, 56 (4). 1467-1475 doi:10.1016/s0009-2509(00)00372-9 |
|---|
| Plain Text | Armaou, Antonios, Baker, James, D. Christofides, Panagiotis (2001) Feedback control of plasma etching reactors for improved etching uniformity. Chemical Engineering Science, 56 (4). 1467-1475 doi:10.1016/s0009-2509(00)00372-9 |
|---|
| In | (2001, February) Chemical Engineering Science Vol. 56 (4) Elsevier BV |
|---|
These are possibly similar items as determined by title/reference text matching only.