| Reference Type | Journal (article/letter/editorial) |
|---|
| Title | Plasma enhanced chemical vapor deposition: Modeling and control |
|---|
| Journal | Chemical Engineering Science |
|---|
| Authors | Armaou, Antonios | Author |
|---|
| Christofides, Panagiotis D. | Author |
| Year | 1999 (July) | Volume | 54 |
|---|
| Issue | 15 |
|---|
| Publisher | Elsevier BV |
|---|
| DOI | doi:10.1016/s0009-2509(98)00458-8Search in ResearchGate |
|---|
| Generate Citation Formats |
| Mindat Ref. ID | 6282271 | Long-form Identifier | mindat:1:5:6282271:4 |
|---|
|
| GUID | 0 |
|---|
| Full Reference | Armaou, Antonios, Christofides, Panagiotis D. (1999) Plasma enhanced chemical vapor deposition: Modeling and control. Chemical Engineering Science, 54 (15). 3305-3314 doi:10.1016/s0009-2509(98)00458-8 |
|---|
| Plain Text | Armaou, Antonios, Christofides, Panagiotis D. (1999) Plasma enhanced chemical vapor deposition: Modeling and control. Chemical Engineering Science, 54 (15). 3305-3314 doi:10.1016/s0009-2509(98)00458-8 |
|---|
| In | (1999, July) Chemical Engineering Science Vol. 54 (15) Elsevier BV |
|---|
These are possibly similar items as determined by title/reference text matching only.