Vexler, M. I. (2015) Increasing the efficiency of a silicon tunnel MIS injector of hot electrons by using high-K oxides. Technical Physics Letters, 41. 863-866 doi:10.1134/s1063785015090102
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Increasing the efficiency of a silicon tunnel MIS injector of hot electrons by using high-K oxides | ||
| Journal | Technical Physics Letters | ||
| Authors | Vexler, M. I. | Author | |
| Year | 2015 (September) | Volume | 41 |
| Publisher | Pleiades Publishing Ltd | ||
| DOI | doi:10.1134/s1063785015090102Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 6209033 | Long-form Identifier | mindat:1:5:6209033:3 |
| GUID | 0 | ||
| Full Reference | Vexler, M. I. (2015) Increasing the efficiency of a silicon tunnel MIS injector of hot electrons by using high-K oxides. Technical Physics Letters, 41. 863-866 doi:10.1134/s1063785015090102 | ||
| Plain Text | Vexler, M. I. (2015) Increasing the efficiency of a silicon tunnel MIS injector of hot electrons by using high-K oxides. Technical Physics Letters, 41. 863-866 doi:10.1134/s1063785015090102 | ||
| In | (n.d.) Technical Physics Letters Vol. 41. Pleiades Publishing Ltd | ||
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