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Novak, A. V., Nikol’skii, Yu. V., Fokichev, S. N. (2012) Studying the morphology of hemispherical-grain polycrystalline silicon films. Technical Physics Letters, 38. 732-735 doi:10.1134/s1063785012080202

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Reference TypeJournal (article/letter/editorial)
TitleStudying the morphology of hemispherical-grain polycrystalline silicon films
JournalTechnical Physics Letters
AuthorsNovak, A. V.Author
Nikol’skii, Yu. V.Author
Fokichev, S. N.Author
Year2012 (August)Volume38
PublisherPleiades Publishing Ltd
DOIdoi:10.1134/s1063785012080202Search in ResearchGate
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Mindat Ref. ID6208052Long-form Identifiermindat:1:5:6208052:1
GUID0
Full ReferenceNovak, A. V., Nikol’skii, Yu. V., Fokichev, S. N. (2012) Studying the morphology of hemispherical-grain polycrystalline silicon films. Technical Physics Letters, 38. 732-735 doi:10.1134/s1063785012080202
Plain TextNovak, A. V., Nikol’skii, Yu. V., Fokichev, S. N. (2012) Studying the morphology of hemispherical-grain polycrystalline silicon films. Technical Physics Letters, 38. 732-735 doi:10.1134/s1063785012080202
In(n.d.) Technical Physics Letters Vol. 38. Pleiades Publishing Ltd

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