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Li, Bin, Zhang, Jizong, Ge, Haixiong (2013) A sandwiched flexible polymer mold for control of particle-induced defects in nanoimprint lithography. Applied Physics A, 110. 123-128 doi:10.1007/s00339-012-7334-3

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Reference TypeJournal (article/letter/editorial)
TitleA sandwiched flexible polymer mold for control of particle-induced defects in nanoimprint lithography
JournalApplied Physics A
AuthorsLi, BinAuthor
Zhang, JizongAuthor
Ge, HaixiongAuthor
Year2013 (January)Volume110
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s00339-012-7334-3Search in ResearchGate
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Mindat Ref. ID6016062Long-form Identifiermindat:1:5:6016062:9
GUID0
Full ReferenceLi, Bin, Zhang, Jizong, Ge, Haixiong (2013) A sandwiched flexible polymer mold for control of particle-induced defects in nanoimprint lithography. Applied Physics A, 110. 123-128 doi:10.1007/s00339-012-7334-3
Plain TextLi, Bin, Zhang, Jizong, Ge, Haixiong (2013) A sandwiched flexible polymer mold for control of particle-induced defects in nanoimprint lithography. Applied Physics A, 110. 123-128 doi:10.1007/s00339-012-7334-3
In(2013) Applied Physics A Vol. 110. Springer Science and Business Media LLC

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Xia, Dingfu, Ye, Liang, Guo, Xu, Cui, Yushuang, Zhang, Jizong, Yuan, Changsheng, Ge, Haixiong, Wu, Wei, Chen, Yanfeng (2012) A dual-curable transfer layer for adhesion enhancement of a multilayer UV-curable nanoimprint resist system. Applied Physics A, 108. 1-6 doi:10.1007/s00339-012-6911-9
Qian, Mingcheng, Zhang, Weichao, Trefilov, Denis, Ji, Min, Cui, Yushuang, Yuan, Changsheng, Li, Wendi, Ge, Haixiong, Chen, Yanfeng (2016) Tuning the period of nanogratings using mechanical stretching and nanoimprint lithography. Applied Physics A, 122. doi:10.1007/s00339-016-0106-8
Cui, Yushuang, Lu, Jingjun, Fu, XinXin, Bian, Jie, Yuan, Changsheng, Ge, Haixiong, Chen, Yanfeng (2015) Near-zero-residual layer nanoimprint based on hybrid nanoimprint soft lithography. Applied Physics A, 121. 371-375 doi:10.1007/s00339-015-9195-z
Bian, Jie, Yang, Tao, Yuan, Changsheng, Ge, Haixiong, Chen, Yanfeng (2014) Sub-50 nm UV-curing nanoimprint based on fluoropolymer, CYTOP, mold. Applied Physics A, 116. 79-84 doi:10.1007/s00339-013-8124-2
Yang, Tao, Fu, Xinxin, Zhang, Qian, Cui, Yushuang, Yuan, Changsheng, Zhang, Weihua, Ge, Haixiong, Chen, Yanfeng (2014) Fabrication of Ag nanodot array over large area for surface-enhanced Raman scattering using hybrid nanoimprint mold made from AAO template. Applied Physics A, 117. 909-915 doi:10.1007/s00339-014-8454-8
Fu, Xinxin, Yang, Wenting, He, Mengjia, Li, Yang, Hao, Zongbin, He, Yuting, Yuan, Changsheng, Cui, Yushuang, Ge, Haixiong (2020) A titanium-nickel composite mold with low surface energy for thermal nanoimprint lithography. Materials Letters, 260. 126867pp. doi:10.1016/j.matlet.2019.126867
Wu, Wei, Walmsley, Robert G., Li, Wen-Di, Li, Xuema, Williams, R. Stanley (2012) Nanoimprint lithography with ≤60 nm overlay precision. Applied Physics A, 106. 767-772 doi:10.1007/s00339-012-6775-z
Tang, Feiyi, Shao, Ziming, Ni, Mengyang, Cui, Yushuang, Yuan, Changsheng, Ge, Haixiong (2019) Fabrication of perforated polyethylene microfiltration membranes for circulating tumor cells separation by thermal nanoimprint method. Applied Physics A, 125. doi:10.1007/s00339-018-2343-5
Rosset, Samuel, Shea, Herbert R. (2013) Flexible and stretchable electrodes for dielectric elastomer actuators. Applied Physics A, 110. 281-307 doi:10.1007/s00339-012-7402-8
Schift, Helmut (2015) Nanoimprint lithography: 2D or not 2D? A review. Applied Physics A, 121. 415-435 doi:10.1007/s00339-015-9106-3
Austin, Michael D., Ge, Haixiong, Wu, Wei, Li, Mingtao, Yu, Zhaoning, Wasserman, D., Lyon, S. A., Chou, Stephen Y. (2004) Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography. Applied Physics Letters, 84 (26). 5299-5301 doi:10.1063/1.1766071
 
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