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Wu, Wei, Walmsley, Robert G., Li, Wen-Di, Li, Xuema, Williams, R. Stanley (2012) Nanoimprint lithography with ≤60 nm overlay precision. Applied Physics A, 106. 767-772 doi:10.1007/s00339-012-6775-z

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Reference TypeJournal (article/letter/editorial)
TitleNanoimprint lithography with ≤60 nm overlay precision
JournalApplied Physics A
AuthorsWu, WeiAuthor
Walmsley, Robert G.Author
Li, Wen-DiAuthor
Li, XuemaAuthor
Williams, R. StanleyAuthor
Year2012 (March)Volume106
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s00339-012-6775-zSearch in ResearchGate
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Mindat Ref. ID6015597Long-form Identifiermindat:1:5:6015597:3
GUID0
Full ReferenceWu, Wei, Walmsley, Robert G., Li, Wen-Di, Li, Xuema, Williams, R. Stanley (2012) Nanoimprint lithography with ≤60 nm overlay precision. Applied Physics A, 106. 767-772 doi:10.1007/s00339-012-6775-z
Plain TextWu, Wei, Walmsley, Robert G., Li, Wen-Di, Li, Xuema, Williams, R. Stanley (2012) Nanoimprint lithography with ≤60 nm overlay precision. Applied Physics A, 106. 767-772 doi:10.1007/s00339-012-6775-z
In(2012) Applied Physics A Vol. 106. Springer Science and Business Media LLC

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Jung, Gun-Young, Li, Zhiyong, Wu, Wei, Ganapathiappan, S., Li, Xuema, Olynick, Deirdre L., Wang, S. Y., Tong, William M., Williams, R. Stanley (2005) Improved Pattern Transfer in Nanoimprint Lithography at 30 nm Half-Pitch by Substrate−Surface Functionalization. Langmuir, 21. 6127-6130 doi:10.1021/la050021c
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