Boyd, Adam R., Degroote, Stefan, Leys, Maarten, Schulte, Frank, Rockenfeller, Olaf, Luenenbuerger, Markus, Germain, Marianne, Kaeppeler, Johannes, Heuken, Michael (2009) Growth of GaN/AlGaN on 200 mm diameter silicon (111) wafers by MOCVD. physica status solidi (c), 6. doi:10.1002/pssc.200880925
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Growth of GaN/AlGaN on 200 mm diameter silicon (111) wafers by MOCVD | ||
| Journal | physica status solidi (c) | ||
| Authors | Boyd, Adam R. | Author | |
| Degroote, Stefan | Author | ||
| Leys, Maarten | Author | ||
| Schulte, Frank | Author | ||
| Rockenfeller, Olaf | Author | ||
| Luenenbuerger, Markus | Author | ||
| Germain, Marianne | Author | ||
| Kaeppeler, Johannes | Author | ||
| Heuken, Michael | Author | ||
| Year | 2009 (June) | Volume | 6 |
| Publisher | Wiley | ||
| DOI | doi:10.1002/pssc.200880925Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5117311 | Long-form Identifier | mindat:1:5:5117311:7 |
| GUID | 0 | ||
| Full Reference | Boyd, Adam R., Degroote, Stefan, Leys, Maarten, Schulte, Frank, Rockenfeller, Olaf, Luenenbuerger, Markus, Germain, Marianne, Kaeppeler, Johannes, Heuken, Michael (2009) Growth of GaN/AlGaN on 200 mm diameter silicon (111) wafers by MOCVD. physica status solidi (c), 6. doi:10.1002/pssc.200880925 | ||
| Plain Text | Boyd, Adam R., Degroote, Stefan, Leys, Maarten, Schulte, Frank, Rockenfeller, Olaf, Luenenbuerger, Markus, Germain, Marianne, Kaeppeler, Johannes, Heuken, Michael (2009) Growth of GaN/AlGaN on 200 mm diameter silicon (111) wafers by MOCVD. physica status solidi (c), 6. doi:10.1002/pssc.200880925 | ||
| In | (2009) physica status solidi (c) Vol. 6. Wiley | ||
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