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Nair, Jaya P., Zon, Ilya, Oron, Matti, Popovitz-Biro, Ronit, Feldman, Yishay, Lubomirsky, Igor (2002) Stoichiometry control during deposition by ion beam sputtering. Journal of Applied Physics, 92 (8). 4784-4790 doi:10.1063/1.1502916

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Reference TypeJournal (article/letter/editorial)
TitleStoichiometry control during deposition by ion beam sputtering
JournalJournal of Applied Physics
AuthorsNair, Jaya P.Author
Zon, IlyaAuthor
Oron, MattiAuthor
Popovitz-Biro, RonitAuthor
Feldman, YishayAuthor
Lubomirsky, IgorAuthor
Year2002 (October 15)Volume92
Issue8
PublisherAIP Publishing
DOIdoi:10.1063/1.1502916Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5116987Long-form Identifiermindat:1:5:5116987:7
GUID0
Full ReferenceNair, Jaya P., Zon, Ilya, Oron, Matti, Popovitz-Biro, Ronit, Feldman, Yishay, Lubomirsky, Igor (2002) Stoichiometry control during deposition by ion beam sputtering. Journal of Applied Physics, 92 (8). 4784-4790 doi:10.1063/1.1502916
Plain TextNair, Jaya P., Zon, Ilya, Oron, Matti, Popovitz-Biro, Ronit, Feldman, Yishay, Lubomirsky, Igor (2002) Stoichiometry control during deposition by ion beam sputtering. Journal of Applied Physics, 92 (8). 4784-4790 doi:10.1063/1.1502916
In(2002, October) Journal of Applied Physics Vol. 92 (8) AIP Publishing

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