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Furukawa, Taisuke, Yuuki, Akimasa, Ono, Kouichi (1997) Recovery of time-dependent dielectric breakdown lifetime of thin oxide films by thermal annealing. Journal of Applied Physics, 82 (7). 3462-3468 doi:10.1063/1.365662

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Reference TypeJournal (article/letter/editorial)
TitleRecovery of time-dependent dielectric breakdown lifetime of thin oxide films by thermal annealing
JournalJournal of Applied Physics
AuthorsFurukawa, TaisukeAuthor
Yuuki, AkimasaAuthor
Ono, KouichiAuthor
Year1997 (October)Volume82
Issue7
PublisherAIP Publishing
DOIdoi:10.1063/1.365662Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5088656Long-form Identifiermindat:1:5:5088656:0
GUID0
Full ReferenceFurukawa, Taisuke, Yuuki, Akimasa, Ono, Kouichi (1997) Recovery of time-dependent dielectric breakdown lifetime of thin oxide films by thermal annealing. Journal of Applied Physics, 82 (7). 3462-3468 doi:10.1063/1.365662
Plain TextFurukawa, Taisuke, Yuuki, Akimasa, Ono, Kouichi (1997) Recovery of time-dependent dielectric breakdown lifetime of thin oxide films by thermal annealing. Journal of Applied Physics, 82 (7). 3462-3468 doi:10.1063/1.365662
In(1997, October) Journal of Applied Physics Vol. 82 (7) AIP Publishing

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