Opila, Elizabeth J. (2004) Variation of the Oxidation Rate of Silicon Carbide with Water-Vapor Pressure. Journal of the American Ceramic Society, 82 (3). 625-636 doi:10.1111/j.1151-2916.1999.tb01810.x
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Variation of the Oxidation Rate of Silicon Carbide with Water-Vapor Pressure | ||
| Journal | Journal of the American Ceramic Society | ||
| Authors | Opila, Elizabeth J. | Author | |
| Year | 2004 (December 22) | Volume | 82 |
| Issue | 3 | ||
| Publisher | Wiley | ||
| DOI | doi:10.1111/j.1151-2916.1999.tb01810.xSearch in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 4094475 | Long-form Identifier | mindat:1:5:4094475:9 |
| GUID | 0 | ||
| Full Reference | Opila, Elizabeth J. (2004) Variation of the Oxidation Rate of Silicon Carbide with Water-Vapor Pressure. Journal of the American Ceramic Society, 82 (3). 625-636 doi:10.1111/j.1151-2916.1999.tb01810.x | ||
| Plain Text | Opila, Elizabeth J. (2004) Variation of the Oxidation Rate of Silicon Carbide with Water-Vapor Pressure. Journal of the American Ceramic Society, 82 (3). 625-636 doi:10.1111/j.1151-2916.1999.tb01810.x | ||
| In | (2004, December) Journal of the American Ceramic Society Vol. 82 (3) Wiley | ||
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