Nagahori, Atsushi, Raj, Rishi (1995) Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Tantalum Oxide Thin Films on Silicon near Room Temperature. Journal of the American Ceramic Society, 78 (6). 1585-1592 doi:10.1111/j.1151-2916.1995.tb08855.x
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Tantalum Oxide Thin Films on Silicon near Room Temperature | ||
| Journal | Journal of the American Ceramic Society | ||
| Authors | Nagahori, Atsushi | Author | |
| Raj, Rishi | Author | ||
| Year | 1995 (June) | Volume | 78 |
| Issue | 6 | ||
| Publisher | Wiley | ||
| DOI | doi:10.1111/j.1151-2916.1995.tb08855.xSearch in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 4092415 | Long-form Identifier | mindat:1:5:4092415:3 |
| GUID | 0 | ||
| Full Reference | Nagahori, Atsushi, Raj, Rishi (1995) Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Tantalum Oxide Thin Films on Silicon near Room Temperature. Journal of the American Ceramic Society, 78 (6). 1585-1592 doi:10.1111/j.1151-2916.1995.tb08855.x | ||
| Plain Text | Nagahori, Atsushi, Raj, Rishi (1995) Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Tantalum Oxide Thin Films on Silicon near Room Temperature. Journal of the American Ceramic Society, 78 (6). 1585-1592 doi:10.1111/j.1151-2916.1995.tb08855.x | ||
| In | (1995, June) Journal of the American Ceramic Society Vol. 78 (6) Wiley | ||
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