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Hwang, Cheol Seong, Kim, Hyeong Joon (1995) Pb-Diffusion Barrier Layers for PbTiO3 Thin Films Deposited on Si Substrates by Metal Organic Chemical Vapor Deposition. Journal of the American Ceramic Society, 78 (2). 337-341 doi:10.1111/j.1151-2916.1995.tb08805.x

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Reference TypeJournal (article/letter/editorial)
TitlePb-Diffusion Barrier Layers for PbTiO3 Thin Films Deposited on Si Substrates by Metal Organic Chemical Vapor Deposition
JournalJournal of the American Ceramic Society
AuthorsHwang, Cheol SeongAuthor
Kim, Hyeong JoonAuthor
Year1995 (February)Volume78
Issue2
PublisherWiley
DOIdoi:10.1111/j.1151-2916.1995.tb08805.xSearch in ResearchGate
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Mindat Ref. ID4092200Long-form Identifiermindat:1:5:4092200:3
GUID0
Full ReferenceHwang, Cheol Seong, Kim, Hyeong Joon (1995) Pb-Diffusion Barrier Layers for PbTiO3 Thin Films Deposited on Si Substrates by Metal Organic Chemical Vapor Deposition. Journal of the American Ceramic Society, 78 (2). 337-341 doi:10.1111/j.1151-2916.1995.tb08805.x
Plain TextHwang, Cheol Seong, Kim, Hyeong Joon (1995) Pb-Diffusion Barrier Layers for PbTiO3 Thin Films Deposited on Si Substrates by Metal Organic Chemical Vapor Deposition. Journal of the American Ceramic Society, 78 (2). 337-341 doi:10.1111/j.1151-2916.1995.tb08805.x
In(1995, February) Journal of the American Ceramic Society Vol. 78 (2) Wiley

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Hwang, Cheol Seong, Kim, Hyeong Joon (1995) Deposition of Pb(Zr,Ti)O3 Thin Films by Metal-Organic Chemical Vapor Deposition Using β-diketonate Precursors at Low Temperatures. Journal of the American Ceramic Society, 78 (2). 329-336 doi:10.1111/j.1151-2916.1995.tb08804.x
Lee, Jong Myeong, Cho, Hae Seok, Shin, Ju Cheol, Kim, Hyeong Joon, Kim, Dal-Young, SookIllKwun, (1995) Optical Property of $\bf Pb(Zr, Ti)O_{3}$ Thin Films Deposited on Transparent Substrates by Atmospheric-Pressure Metal-Organic Chemical Vapor Deposition. Japanese Journal of Applied Physics, 34. 6112-6115 doi:10.1143/jjap.34.6112
No, Sang Yong, Eom, Dail, Hwang, Cheol Seong, Kim, Hyeong Joon (2006) Properties of lanthanum oxide thin films deposited by cyclic chemical vapor deposition using tris(isopropyl-cyclopentadienyl)lanthanum precursor. Journal of Applied Physics, 100 (2). 24111pp. doi:10.1063/1.2218465
Nagahori, Atsushi, Raj, Rishi (1995) Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Tantalum Oxide Thin Films on Silicon near Room Temperature. Journal of the American Ceramic Society, 78 (6). 1585-1592 doi:10.1111/j.1151-2916.1995.tb08855.x
No, Sang Yong, Eom, Dail, Hwang, Cheol Seong, Kim, Hyeong Joon (2006) Property Changes of Aluminum Oxide Thin Films Deposited by Atomic Layer Deposition under Photon Radiation. Journal of the Electrochemical Society, 153. doi:10.1149/1.2186179
Sang Yeol, Kang, Kook Hyun, Choi, Seok Kiu, Lee, Cheol Seong, Hwang, Hyeong Joon, Kim (2000) Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition. Journal of the Korean Physical Society, 37 (6). 1040pp. doi:10.3938/jkps.37.1040
Kim, Gil-Sung, Hwang, Sang-Chul, Kim, Yoen-Su, Shin, Hyung-Shik (2004) Growth of Yttria-Stabilized Zirconia Thin Films on Textured Silver Substrates by Chemical Vapor Deposition. Journal of the American Ceramic Society, 85 (7). 1897-1899 doi:10.1111/j.1151-2916.2002.tb00376.x
Shin, Ju Cheol, Hong, Jae Wan, Lee, Jong Myeong, Hwang, Cheol Seong, Kim, Hyeong Joon, Khim, Zheong-Gu (1998) Control of the Microstructure of (Pb,La)TiO3Thin Films by Metal-Organic Chemical Vapor Deposition Using a Solid Delivery System for Ferroelectric Domain Memory. Japanese Journal of Applied Physics, 37. 5123-5125 doi:10.1143/jjap.37.5123
Chen, Zhong-Xin, Eyden, Joost, Koot, Wouter, Berg, Rob, Mechelen, Jan van, Derking, Anke (1995) Preparation of Zinc Titanate Thin Films by Low-Pressure Metalorganic Chemical Vapor Deposition. Journal of the American Ceramic Society, 78 (11). 2993-3001 doi:10.1111/j.1151-2916.1995.tb09075.x
No, Sang Yong, Oh, Jin Ho, Jeon, Chung Bae, Schindler, Mathias, Hwang, Cheol Seong, Kim, Hyeong Joon (2005) Study on the Step Coverage of Metallorganic Chemical Vapor Deposited TiO[sub 2] and SrTiO[sub 3] Thin Films. Journal of the Electrochemical Society, 152. doi:10.1149/1.1915287
Jeong, Jae Kyeong, Na, Hoon Joo, Choi, Jaeho, Hwang, Cheol Seong, Kim, Hyeong Joon, Bahng, Wook (2000) Homoepitaxial growth of 6H–SiC thin films by metal-organic chemical vapor deposition using bis-trimethylsilylmethane precursor. Journal of Crystal Growth, 210 (4). 629-636 doi:10.1016/s0022-0248(99)00744-7
 
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