Takeuchi, Tetsuya, Amano, Hiroshi, Hiramatsu, Kazumasa, Sawaki, Nobuhiko, Akasaki, Isamu (1991) Growth of single crystalline GaN film on Si substrate using 3C-SiC as an intermediate layer. Journal of Crystal Growth, 115 (1). 634-638 doi:10.1016/0022-0248(91)90817-o
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Growth of single crystalline GaN film on Si substrate using 3C-SiC as an intermediate layer | ||
| Journal | Journal of Crystal Growth | ||
| Authors | Takeuchi, Tetsuya | Author | |
| Amano, Hiroshi | Author | ||
| Hiramatsu, Kazumasa | Author | ||
| Sawaki, Nobuhiko | Author | ||
| Akasaki, Isamu | Author | ||
| Year | 1991 (December) | Volume | 115 |
| Issue | 1 | ||
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/0022-0248(91)90817-oSearch in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 2804247 | Long-form Identifier | mindat:1:5:2804247:5 |
| GUID | 0 | ||
| Full Reference | Takeuchi, Tetsuya, Amano, Hiroshi, Hiramatsu, Kazumasa, Sawaki, Nobuhiko, Akasaki, Isamu (1991) Growth of single crystalline GaN film on Si substrate using 3C-SiC as an intermediate layer. Journal of Crystal Growth, 115 (1). 634-638 doi:10.1016/0022-0248(91)90817-o | ||
| Plain Text | Takeuchi, Tetsuya, Amano, Hiroshi, Hiramatsu, Kazumasa, Sawaki, Nobuhiko, Akasaki, Isamu (1991) Growth of single crystalline GaN film on Si substrate using 3C-SiC as an intermediate layer. Journal of Crystal Growth, 115 (1). 634-638 doi:10.1016/0022-0248(91)90817-o | ||
| In | (1991, December) Journal of Crystal Growth Vol. 115 (1) Elsevier BV | ||
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