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Chen, Kai Huang, Yang, Cheng Fu (2010) The Influence of Oxygen Plasma Treatment on the Electrical Properties of (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films. Key Engineering Materials, 434. 267-270 doi:10.4028/www.scientific.net/kem.434-435.267

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Reference TypeJournal (article/letter/editorial)
TitleThe Influence of Oxygen Plasma Treatment on the Electrical Properties of (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films
JournalKey Engineering Materials
AuthorsChen, Kai HuangAuthor
Yang, Cheng FuAuthor
Year2010 (March)Volume434
PublisherTrans Tech Publications, Ltd.
DOIdoi:10.4028/www.scientific.net/kem.434-435.267Search in ResearchGate
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Mindat Ref. ID12006619Long-form Identifiermindat:1:5:12006619:5
GUID0
Full ReferenceChen, Kai Huang, Yang, Cheng Fu (2010) The Influence of Oxygen Plasma Treatment on the Electrical Properties of (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films. Key Engineering Materials, 434. 267-270 doi:10.4028/www.scientific.net/kem.434-435.267
Plain TextChen, Kai Huang, Yang, Cheng Fu (2010) The Influence of Oxygen Plasma Treatment on the Electrical Properties of (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films. Key Engineering Materials, 434. 267-270 doi:10.4028/www.scientific.net/kem.434-435.267
In(n.d.) Key Engineering Materials Vol. 434. Trans Tech Publications, Ltd.

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Chen, Kai Huang, Yang, Cheng Fu, Diao, Chien Chen (2010) The Electrical and Physical Properties of (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films under Conventional Annealing Process. Key Engineering Materials, 434. 271-274 doi:10.4028/www.scientific.net/kem.434-435.271
Tzou, Wen Cheng, Chen, Kai Huang, Yang, Cheng Fu, Chen, Ying Chung (2010) Memory Properties of SrBi2Ta2O9/ Ba(Zr0.1Ti0.9)O3 Thin Films Prepared on Si Substrate. Key Engineering Materials, 434. 304-306 doi:10.4028/www.scientific.net/kem.434-435.304
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Chen, Kai Huang, Wu, Chia Lin, Lin, Jian Yang, Cheng, Chien Min (2011) Improvement on Oxygen Vacancies Effect of High Dielectric Constant (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films Using by Plasma Treatment. Advanced Materials Research, 239. 1002-1005 doi:10.4028/www.scientific.net/amr.239-242.1002
Diao, Chien Chen, Wu, Chia Ching, Yang, Cheng Fu, Chan, Chao Chin (2010) The Influence of Annealing Temperature on the Characteristics of 0.95 (Na0.5Bi0.5)TiO3-0.05 BaTiO3 Thin Films. Key Engineering Materials, 434. 263-266 doi:10.4028/www.scientific.net/kem.434-435.263
Chen, Kai Huang, Chen, Ying Chung, Chia, Wei Kuo, Chen, Zhi Sheng, Yang, Cheng Fu, Chung, Ho Hua (2008) Electrical and Physical Characteristics of Ba(Zr0.1Ti0.9)O3 Thin Films under Oxygen Plasma Treatment for Nonvolatile Memory Devices Application. Key Engineering Materials, 368. 75-77 doi:10.4028/www.scientific.net/kem.368-372.75
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