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Chen, Kai Huang, Wu, Chia Lin, Lin, Jian Yang, Cheng, Chien Min (2011) Improvement on Oxygen Vacancies Effect of High Dielectric Constant (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films Using by Plasma Treatment. Advanced Materials Research, 239. 1002-1005 doi:10.4028/www.scientific.net/amr.239-242.1002

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Reference TypeJournal (article/letter/editorial)
TitleImprovement on Oxygen Vacancies Effect of High Dielectric Constant (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films Using by Plasma Treatment
JournalAdvanced Materials Research
AuthorsChen, Kai HuangAuthor
Wu, Chia LinAuthor
Lin, Jian YangAuthor
Cheng, Chien MinAuthor
Year2011 (May)Volume239
PublisherTrans Tech Publications, Ltd.
DOIdoi:10.4028/www.scientific.net/amr.239-242.1002Search in ResearchGate
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Mindat Ref. ID11642491Long-form Identifiermindat:1:5:11642491:6
GUID0
Full ReferenceChen, Kai Huang, Wu, Chia Lin, Lin, Jian Yang, Cheng, Chien Min (2011) Improvement on Oxygen Vacancies Effect of High Dielectric Constant (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films Using by Plasma Treatment. Advanced Materials Research, 239. 1002-1005 doi:10.4028/www.scientific.net/amr.239-242.1002
Plain TextChen, Kai Huang, Wu, Chia Lin, Lin, Jian Yang, Cheng, Chien Min (2011) Improvement on Oxygen Vacancies Effect of High Dielectric Constant (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films Using by Plasma Treatment. Advanced Materials Research, 239. 1002-1005 doi:10.4028/www.scientific.net/amr.239-242.1002
In(n.d.) Advanced Materials Research Vol. 239. Trans Tech Publications, Ltd.

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Chen, Kai Huang, Yang, Cheng Fu (2010) The Influence of Oxygen Plasma Treatment on the Electrical Properties of (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 Thin Films. Key Engineering Materials, 434. 267-270 doi:10.4028/www.scientific.net/kem.434-435.267
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