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Wang, P.P., Xu, C., Fu, E.G., Du, J.L., Gao, Y., Wang, X.J., Qiu, Y.H. (2018) The study on the electrical resistivity of Cu/V multilayer films subjected to helium (He) ion irradiation. Applied Surface Science, 440. 396-402 doi:10.1016/j.apsusc.2018.01.072

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Reference TypeJournal (article/letter/editorial)
TitleThe study on the electrical resistivity of Cu/V multilayer films subjected to helium (He) ion irradiation
JournalApplied Surface Science
AuthorsWang, P.P.Author
Xu, C.Author
Fu, E.G.Author
Du, J.L.Author
Gao, Y.Author
Wang, X.J.Author
Qiu, Y.H.Author
Year2018 (May)Volume440
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2018.01.072Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9933802Long-form Identifiermindat:1:5:9933802:6
GUID0
Full ReferenceWang, P.P., Xu, C., Fu, E.G., Du, J.L., Gao, Y., Wang, X.J., Qiu, Y.H. (2018) The study on the electrical resistivity of Cu/V multilayer films subjected to helium (He) ion irradiation. Applied Surface Science, 440. 396-402 doi:10.1016/j.apsusc.2018.01.072
Plain TextWang, P.P., Xu, C., Fu, E.G., Du, J.L., Gao, Y., Wang, X.J., Qiu, Y.H. (2018) The study on the electrical resistivity of Cu/V multilayer films subjected to helium (He) ion irradiation. Applied Surface Science, 440. 396-402 doi:10.1016/j.apsusc.2018.01.072
In(n.d.) Applied Surface Science Vol. 440. Elsevier BV

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