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Liu, Han Fa, Zhang, Hua Fu, Zhou, Ai Ping (2010) Influence of the Distance between Target and Substrate on the Properties of TGZO Films Prepared by DC Magnetron Sputtering. Materials Science Forum, 663. 572-575 doi:10.4028/www.scientific.net/msf.663-665.572

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of the Distance between Target and Substrate on the Properties of TGZO Films Prepared by DC Magnetron Sputtering
JournalMaterials Science Forum
AuthorsLiu, Han FaAuthor
Zhang, Hua FuAuthor
Zhou, Ai PingAuthor
Year2010 (November)Volume663
PublisherTrans Tech Publications, Ltd.
DOIdoi:10.4028/www.scientific.net/msf.663-665.572Search in ResearchGate
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Mindat Ref. ID9872249Long-form Identifiermindat:1:5:9872249:5
GUID0
Full ReferenceLiu, Han Fa, Zhang, Hua Fu, Zhou, Ai Ping (2010) Influence of the Distance between Target and Substrate on the Properties of TGZO Films Prepared by DC Magnetron Sputtering. Materials Science Forum, 663. 572-575 doi:10.4028/www.scientific.net/msf.663-665.572
Plain TextLiu, Han Fa, Zhang, Hua Fu, Zhou, Ai Ping (2010) Influence of the Distance between Target and Substrate on the Properties of TGZO Films Prepared by DC Magnetron Sputtering. Materials Science Forum, 663. 572-575 doi:10.4028/www.scientific.net/msf.663-665.572
In(2010) Materials Science Forum Vol. 663. Trans Tech Publications, Ltd.

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