Nichols, C.S., Smith, David A. (1993) Stress-Voiding and Electromigration Failures in Narrow Metal Interconnects. Materials Science Forum, 126. 351-354 doi:10.4028/www.scientific.net/msf.126-128.351
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Stress-Voiding and Electromigration Failures in Narrow Metal Interconnects | ||
| Journal | Materials Science Forum | ||
| Authors | Nichols, C.S. | Author | |
| Smith, David A. | Author | ||
| Year | 1993 (January) | Volume | 126 |
| Publisher | Trans Tech Publications, Ltd. | ||
| DOI | doi:10.4028/www.scientific.net/msf.126-128.351Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 9841311 | Long-form Identifier | mindat:1:5:9841311:7 |
| GUID | 0 | ||
| Full Reference | Nichols, C.S., Smith, David A. (1993) Stress-Voiding and Electromigration Failures in Narrow Metal Interconnects. Materials Science Forum, 126. 351-354 doi:10.4028/www.scientific.net/msf.126-128.351 | ||
| Plain Text | Nichols, C.S., Smith, David A. (1993) Stress-Voiding and Electromigration Failures in Narrow Metal Interconnects. Materials Science Forum, 126. 351-354 doi:10.4028/www.scientific.net/msf.126-128.351 | ||
| In | (1993) Materials Science Forum Vol. 126. Trans Tech Publications, Ltd. | ||
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