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Reference Type	Journal (article/letter/editorial)
Title	Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes
Journal	Materials Science Forum
Authors	Rohde, S.L.		Author
Year	1992 (January)	Volume	102
Publisher	Trans Tech Publications, Ltd.
DOI	doi:10.4028/www.scientific.net/msf.102-104.563Search in ResearchGate
	Generate Citation Formats
Mindat Ref. ID	9840281	Long-form Identifier	mindat:1:5:9840281:0
GUID	0
Full Reference	Rohde, S.L. (1992) Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes. Materials Science Forum, 102. 563-572 doi:10.4028/www.scientific.net/msf.102-104.563
Plain Text	Rohde, S.L. (1992) Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes. Materials Science Forum, 102. 563-572 doi:10.4028/www.scientific.net/msf.102-104.563
In	(1992) Materials Science Forum Vol. 102. Trans Tech Publications, Ltd.

	*Zlatanović, M., Gredic, T. (1992) Combined Plasma Nitriding/PVD Processes. Materials Science Forum, 102. 655-666 doi:10.4028/www.scientific.net/msf.102-104.655*
	Liu, Yan Qiu, Sun, Hong, Li, Xin, Huang, Nan (2015) Cytocompatibility of Fe-O Thin Film Prepared by Unbalanced Magnetron Sputtering. Materials Science Forum, 815. 390-395 doi:10.4028/www.scientific.net/msf.815.390
	*Edenhofer, B., Bless, F., Peter, W. (1992) Progress in Vacuum- and Plasma-Technology. Materials Science Forum, 102. 849-858 doi:10.4028/www.scientific.net/msf.102-104.849*
	*(1992) Materials Science Forum, 102. Trans Tech Publications, Ltd. doi:10.4028/www.scientific.net/msf.102-104*
	*Elliott, T.L. (1992) Commercial Heat Treatment to 2000 AD. Materials Science Forum, 102. 63-74 doi:10.4028/www.scientific.net/msf.102-104.63*
	*Alonso, F., Fagoaga, I., Oregui, P. (1992) Plasma-Spray Coatings on Carbon-Epoxy Substrates. Materials Science Forum, 102. 709-720 doi:10.4028/www.scientific.net/msf.102-104.709*
	*Kühn, F. (1992) Computer-Aided Optimization of Heat-Treatment Processes for the Automobile Industry. Materials Science Forum, 102. 809-820 doi:10.4028/www.scientific.net/msf.102-104.809*
	*Stein, W. (1992) A New Generation of Process Computers for the Heat-Treatment Processes. Materials Science Forum, 102. 821-830 doi:10.4028/www.scientific.net/msf.102-104.821*
	Jacquot, P., Buvron, M., Souchard, J.P. (1992) Plasma Nitriding and Plasma Carburizing of Pure Titanium and Ti6Al4V Alloy. Materials Science Forum, 102. 301-318 doi:10.4028/www.scientific.net/msf.102-104.301
	*Leyland, A., Stevenson, P.R., Matthews, A. (1992) Tribological Performance of Plasma Treated and Coated Surfaces. Materials Science Forum, 102. 615-622 doi:10.4028/www.scientific.net/msf.102-104.615*
	*Kay, A. (1992) Multiflow Pressure Quenching in Vacuum Furnaces. Materials Science Forum, 102. 885-896 doi:10.4028/www.scientific.net/msf.102-104.885*

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Rohde, S.L. (1992) Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes. Materials Science Forum, 102. 563-572 doi:10.4028/www.scientific.net/msf.102-104.563

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