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Stewart, James A., Spearot, Douglas E. (2016) Phase-field models for simulating physical vapor deposition and grain evolution of isotropic single-phase polycrystalline thin films. Computational Materials Science, 123. 111-120 doi:10.1016/j.commatsci.2016.06.021

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Reference TypeJournal (article/letter/editorial)
TitlePhase-field models for simulating physical vapor deposition and grain evolution of isotropic single-phase polycrystalline thin films
JournalComputational Materials Science
AuthorsStewart, James A.Author
Spearot, Douglas E.Author
Year2016 (October)Volume123
PublisherElsevier BV
DOIdoi:10.1016/j.commatsci.2016.06.021Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9509903Long-form Identifiermindat:1:5:9509903:1
GUID0
Full ReferenceStewart, James A., Spearot, Douglas E. (2016) Phase-field models for simulating physical vapor deposition and grain evolution of isotropic single-phase polycrystalline thin films. Computational Materials Science, 123. 111-120 doi:10.1016/j.commatsci.2016.06.021
Plain TextStewart, James A., Spearot, Douglas E. (2016) Phase-field models for simulating physical vapor deposition and grain evolution of isotropic single-phase polycrystalline thin films. Computational Materials Science, 123. 111-120 doi:10.1016/j.commatsci.2016.06.021
In(n.d.) Computational Materials Science Vol. 123. Elsevier BV

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