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Enomoto, Yoshihisa, Doi, Minoru, Yamada, Yoshihito (1999) Simulation of the pattern evolution of Si-aggregates on the surface of Ag/Si bilayer films. Computational Materials Science, 14 (1). 277-282 doi:10.1016/s0927-0256(98)00119-0

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Reference TypeJournal (article/letter/editorial)
TitleSimulation of the pattern evolution of Si-aggregates on the surface of Ag/Si bilayer films
JournalComputational Materials Science
AuthorsEnomoto, YoshihisaAuthor
Doi, MinoruAuthor
Yamada, YoshihitoAuthor
Year1999 (February)Volume14
Issue1
PublisherElsevier BV
DOIdoi:10.1016/s0927-0256(98)00119-0Search in ResearchGate
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Mindat Ref. ID9503018Long-form Identifiermindat:1:5:9503018:0
GUID0
Full ReferenceEnomoto, Yoshihisa, Doi, Minoru, Yamada, Yoshihito (1999) Simulation of the pattern evolution of Si-aggregates on the surface of Ag/Si bilayer films. Computational Materials Science, 14 (1). 277-282 doi:10.1016/s0927-0256(98)00119-0
Plain TextEnomoto, Yoshihisa, Doi, Minoru, Yamada, Yoshihito (1999) Simulation of the pattern evolution of Si-aggregates on the surface of Ag/Si bilayer films. Computational Materials Science, 14 (1). 277-282 doi:10.1016/s0927-0256(98)00119-0
In(1999, February) Computational Materials Science Vol. 14 (1) Elsevier BV

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