Rampelberg, Geert, Devloo-Casier, Kilian, Deduytsche, Davy, Schaekers, Marc, Blasco, Nicolas, Detavernier, Christophe (2013) Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers. Applied Physics Letters, 102 (11). 111910pp. doi:10.1063/1.4798337
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers | ||
| Journal | Applied Physics Letters | ||
| Authors | Rampelberg, Geert | Author | |
| Devloo-Casier, Kilian | Author | ||
| Deduytsche, Davy | Author | ||
| Schaekers, Marc | Author | ||
| Blasco, Nicolas | Author | ||
| Detavernier, Christophe | Author | ||
| Year | 2013 (March 18) | Volume | 102 |
| Issue | 11 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.4798337Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8611023 | Long-form Identifier | mindat:1:5:8611023:5 |
| GUID | 0 | ||
| Full Reference | Rampelberg, Geert, Devloo-Casier, Kilian, Deduytsche, Davy, Schaekers, Marc, Blasco, Nicolas, Detavernier, Christophe (2013) Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers. Applied Physics Letters, 102 (11). 111910pp. doi:10.1063/1.4798337 | ||
| Plain Text | Rampelberg, Geert, Devloo-Casier, Kilian, Deduytsche, Davy, Schaekers, Marc, Blasco, Nicolas, Detavernier, Christophe (2013) Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers. Applied Physics Letters, 102 (11). 111910pp. doi:10.1063/1.4798337 | ||
| In | (2013, March) Applied Physics Letters Vol. 102 (11) AIP Publishing | ||
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