Cimalla, V., Lebedev, V., Wang, Ch. Y., Ali, M., Ecke, G., Polyakov, V. M., Schwierz, F., Ambacher, O., Lu, H., Schaff, W. J. (2007) Reduced surface electron accumulation at InN films by ozone induced oxidation. Applied Physics Letters, 90 (15). 152106pp. doi:10.1063/1.2721365
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Reduced surface electron accumulation at InN films by ozone induced oxidation | ||
| Journal | Applied Physics Letters | ||
| Authors | Cimalla, V. | Author | |
| Lebedev, V. | Author | ||
| Wang, Ch. Y. | Author | ||
| Ali, M. | Author | ||
| Ecke, G. | Author | ||
| Polyakov, V. M. | Author | ||
| Schwierz, F. | Author | ||
| Ambacher, O. | Author | ||
| Lu, H. | Author | ||
| Schaff, W. J. | Author | ||
| Year | 2007 (April 9) | Volume | 90 |
| Issue | 15 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.2721365Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8553368 | Long-form Identifier | mindat:1:5:8553368:8 |
| GUID | 0 | ||
| Full Reference | Cimalla, V., Lebedev, V., Wang, Ch. Y., Ali, M., Ecke, G., Polyakov, V. M., Schwierz, F., Ambacher, O., Lu, H., Schaff, W. J. (2007) Reduced surface electron accumulation at InN films by ozone induced oxidation. Applied Physics Letters, 90 (15). 152106pp. doi:10.1063/1.2721365 | ||
| Plain Text | Cimalla, V., Lebedev, V., Wang, Ch. Y., Ali, M., Ecke, G., Polyakov, V. M., Schwierz, F., Ambacher, O., Lu, H., Schaff, W. J. (2007) Reduced surface electron accumulation at InN films by ozone induced oxidation. Applied Physics Letters, 90 (15). 152106pp. doi:10.1063/1.2721365 | ||
| In | (2007, April) Applied Physics Letters Vol. 90 (15) AIP Publishing | ||
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