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Ravindran, R., Gangopadhyay, K., Gangopadhyay, S., Mehta, N., Biswas, N. (2006) Permittivity enhancement of aluminum oxide thin films with the addition of silver nanoparticles. Applied Physics Letters, 89 (26). 263511pp. doi:10.1063/1.2425010

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Reference TypeJournal (article/letter/editorial)
TitlePermittivity enhancement of aluminum oxide thin films with the addition of silver nanoparticles
JournalApplied Physics Letters
AuthorsRavindran, R.Author
Gangopadhyay, K.Author
Gangopadhyay, S.Author
Mehta, N.Author
Biswas, N.Author
Year2006 (December 25)Volume89
Issue26
PublisherAIP Publishing
DOIdoi:10.1063/1.2425010Search in ResearchGate
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Mindat Ref. ID8551655Long-form Identifiermindat:1:5:8551655:7
GUID0
Full ReferenceRavindran, R., Gangopadhyay, K., Gangopadhyay, S., Mehta, N., Biswas, N. (2006) Permittivity enhancement of aluminum oxide thin films with the addition of silver nanoparticles. Applied Physics Letters, 89 (26). 263511pp. doi:10.1063/1.2425010
Plain TextRavindran, R., Gangopadhyay, K., Gangopadhyay, S., Mehta, N., Biswas, N. (2006) Permittivity enhancement of aluminum oxide thin films with the addition of silver nanoparticles. Applied Physics Letters, 89 (26). 263511pp. doi:10.1063/1.2425010
In(2006, December) Applied Physics Letters Vol. 89 (26) AIP Publishing

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Harris, H., Choi, K., Mehta, N., Chandolu, A., Biswas, N., Kipshidze, G., Nikishin, S., Gangopadhyay, S., Temkin, H. (2002) HfO2 gate dielectric with 0.5 nm equivalent oxide thickness. Applied Physics Letters, 81 (6). 1065-1067 doi:10.1063/1.1495882
Biswas, N., Wang, X., Gangopadhyay, S. (2002) Electrical properties of amorphous silicon carbide films. Applied Physics Letters, 80 (18). 3439-3441 doi:10.1063/1.1476389
Biswas, N., Harris, H. R., Wang, X., Celebi, G., Temkin, H., Gangopadhyay, S. (2001) Electrical properties of fluorinated amorphous carbon films. Journal of Applied Physics, 89 (8). 4417-4421 doi:10.1063/1.1353804
Apperson, S., Shende, R. V., Subramanian, S., Tappmeyer, D., Gangopadhyay, S., Chen, Z., Gangopadhyay, K., Redner, P., Nicholich, S., Kapoor, D. (2007) Generation of fast propagating combustion and shock waves with copper oxide/aluminum nanothermite composites. Applied Physics Letters, 91 (24). 243109pp. doi:10.1063/1.2787972
Biswas, N., Lubguban, J. A., Gangopadhyay, S. (2004) Electric field and temperature-induced removal of moisture in nanoporous organosilicate films. Applied Physics Letters, 84 (21). 4254-4256 doi:10.1063/1.1757019
Yun, M., Ravindran, R., Hossain, M., Gangopadhyay, S., Scherf, U., Bünnagel, T., Galbrecht, F., Arif, M., Guha, S. (2006) Capacitance-voltage characterization of polyfluorene-based metal-insulator-semiconductor diodes. Applied Physics Letters, 89 (1). 13506pp. doi:10.1063/1.2219147
Lubguban, J., Rajagopalan, T., Mehta, N., Lahlouh, B., Simon, S. L., Gangopadhyay, S. (2002) Low-korganosilicate films prepared by tetravinyltetramethylcyclotetrasiloxane. Journal of Applied Physics, 92 (2). 1033-1038 doi:10.1063/1.1483916
Apperson, S., Shende, R. V., Subramanian, S., Tappmeyer, D., Gangopadhyay, S., Chen, Z., Gangopadhyay, K., Redner, P., Nicholich, S., Kapoor, D. (2008) Erratum: “Generation of fast propagating combustion and shock waves with copper oxide/aluminum nanothermite composites” [Appl. Phys. Lett. 91, 243109 (2007)]. Applied Physics Letters, 92 (22). 229903pp. doi:10.1063/1.2938420
Apperson, S., Shende, R. V., Subramanian, S., Tappmeyer, D., Gangopadhyay, S., Chen, Z., Gangopadhyay, K., Redner, P., Nicholich, S., Kapoor, D. (2008) Erratum: “Generation of fast propagating combustion and shock waves with copper oxide/aluminum nanothermite composites” [Appl. Phys. Lett. 91, 243109 (2007)]. Applied Physics Letters, 92 (12). 129901pp. doi:10.1063/1.2901042
Harris, H., Biswas, N., Temkin, H., Gangopadhyay, S., Strathman, M. (2001) Plasma enhanced metalorganic chemical vapor deposition of amorphous aluminum nitride. Journal of Applied Physics, 90 (11). 5825-5831 doi:10.1063/1.1413484
Park, Pan Kwi, Kang, Sang-Won (2006) Enhancement of dielectric constant in HfO2 thin films by the addition of Al2O3. Applied Physics Letters, 89 (19). 192905pp. doi:10.1063/1.2387126
 
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