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Jenichen, Arndt (1996) Modeling of Etching Reactions:  Ab Initio Calculations of the Reactions of CFm+(m= 1−3) and NFn+(n= 1, 2) with Local Models of SiO2Surface Structures. The Journal of Physical Chemistry, 100 (23). 9820-9823 doi:10.1021/jp953276f

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Reference TypeJournal (article/letter/editorial)
TitleModeling of Etching Reactions:  Ab Initio Calculations of the Reactions of CFm+(m= 1−3) and NFn+(n= 1, 2) with Local Models of SiO2Surface Structures
JournalThe Journal of Physical Chemistry
AuthorsJenichen, ArndtAuthor
Year1996 (January)Volume100
Issue23
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/jp953276fSearch in ResearchGate
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Mindat Ref. ID8041841Long-form Identifiermindat:1:5:8041841:8
GUID0
Full ReferenceJenichen, Arndt (1996) Modeling of Etching Reactions:  Ab Initio Calculations of the Reactions of CFm+(m= 1−3) and NFn+(n= 1, 2) with Local Models of SiO2Surface Structures. The Journal of Physical Chemistry, 100 (23). 9820-9823 doi:10.1021/jp953276f
Plain TextJenichen, Arndt (1996) Modeling of Etching Reactions:  Ab Initio Calculations of the Reactions of CFm+(m= 1−3) and NFn+(n= 1, 2) with Local Models of SiO2Surface Structures. The Journal of Physical Chemistry, 100 (23). 9820-9823 doi:10.1021/jp953276f
In(1996, January) The Journal of Physical Chemistry Vol. 100 (23) American Chemical Society (ACS)

See Also

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Jenichen, Arndt (1997) Mechanisms of SiO2Etching:  Ab Initio Calculations on the Reactions of CFm-(m= 3−1) and NFn-(n= 2, 1) Ions with Local Surface Models. The Journal of Physical Chemistry B, 101 (27). 5377-5381 doi:10.1021/jp970450m
Jenichen, Arndt (1995) Ab initio calculations to the reactions of CFm (m = 4−1) and NFn (n = 3−1) species with models of SiO2 surface structures. Surface Science, 331. 1503-1507 doi:10.1016/0039-6028(95)00311-8
Jenichen, Arndt, Engler, Cornelia (2000) Etching of GaAs(100) Surfaces by Cl2:  Quantum Chemical Calculations on the Mechanisms. The Journal of Physical Chemistry B, 104 (34). 8210-8216 doi:10.1021/jp0007383
Jenichen, Arndt, Engler, Cornelia (2001) Etching of GaAs(100) Surfaces by Halogen Molecules:  Density Functional Calculations on the Different Mechanisms. The Journal of Physical Chemistry B, 105 (10). 1956-1960 doi:10.1021/jp002801u
Zhang, Qingzhu, Zhang, Dongju, Wang, Shaokun, Gu, Yueshu (2002) Ab Initio and Kinetic Calculations for the Reactions of H with (CH3)(4-n)GeHn(n= 1, 2, 3, 4). The Journal of Physical Chemistry A, 106 (1). 122-129 doi:10.1021/jp012730e
Mebel, A. M., Diau, E. W. G., Lin, M. C., Morokuma, K. (1996) Theoretical Rate Constants for the NH3+ NOx→ NH2+ HNOx(x= 1, 2) Reactions by ab Initio MO/VTST Calculations. The Journal of Physical Chemistry, 100 (18). 7517-7525 doi:10.1021/jp953644f
El-Bakali Kassimi, N., Doerksen, Robert J., Thakkar, Ajit J. (1996) Polarizabilities of Oxazoles:  Ab Initio Calculations and Simple Models. The Journal of Physical Chemistry, 100 (21). 8752-8757 doi:10.1021/jp953425u
Wesolowski, Tomasz, Muller, Richard P., Warshel, Arieh (1996) Ab Initio Frozen Density Functional Calculations of Proton Transfer Reactions in Solution. The Journal of Physical Chemistry, 100 (38). 15444-15449 doi:10.1021/jp961068x
Sastry, G. Narahari, Shaik, Sason (1996) Structured Electron Transfer Transition State. Valence Bond Configuration Mixing Analysis and ab Initio Calculations of the Reactions of Formaldehyde Radical Anion with Methyl Chloride. The Journal of Physical Chemistry, 100 (30). 12241-12252 doi:10.1021/jp952827z
Xiao, Jing-Fa, Li, Ze-Sheng, Ding, Yi-Hong, Liu, Jing-Yao, Huang, Xu-Ri, Sun, Chia-Chung (2002) Density Functional Theory and ab Initio Direct Dynamics Studies on the Hydrogen Abstraction Reactions of Chlorine Atoms with CHCl3-nFn(n= 0, 1, and 2) and CH2Cl2. The Journal of Physical Chemistry A, 106 (2). 320-325 doi:10.1021/jp013405u
Wang, Baoshan, Hou, Hua, Gu, Yueshu (1999) Ab Initio and Kinetic Calculations for the Reactions of NH(X3Σ-) with CHxF4-xand CDxF4-x(x= 1, 2, 3, 4). The Journal of Physical Chemistry A, 103 (45). 9049-9054 doi:10.1021/jp992284j
 
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